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A DRY DEVELOPMENT MODEL FOR A POSITIVE ELECTRON BEAM RESIST

Author
YAMADA M; HATTORI S; MORITA S
NAGOYA UNIV., DEP. ELECTRONIC ENG./CHIKUSA-KU NAGOYA 464/JPN
Source
JOURNAL OF THE ELECTROCHEMICAL SOCIETY; ISSN 0013-4651; USA; DA. 1982; VOL. 129; NO 11; PP. 2598-2602; BIBL. 22 REF.
Document type
Article
Language
English
Keyword (fr)
FABRICATION MICROELECTRONIQUE DEVELOPPEMENT RESIST ELECTRORESIST RESIST POSITIF MODELE DEVELOPPEMENT SEC ELECTRONIQUE
Keyword (en)
MICROELECTRONIC FABRICATION DEVELOPMENT RESIST ELECTRORESIST POSITIVE RESIST MODELS ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL83X0213165

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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