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DRY ETCHING OF CRISTALLINE QUARTZ IN A PLANAR PLASMA REACTOR

Author
DANESH P; PANTCHEV BG
BULGARIAN ACAD. SCI., INST. SOLID STATE PHYS./SOFIA 1184 BULGARIAN/BGR
Source
THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1982; VOL. 88; NO 4; PP. 347-352; BIBL. 13 REF.
Document type
Article
Language
English
Keyword (fr)
FABRICATION MICROELECTRONIQUE GRAVURE PLASMA QUARTZ PROCEDE VOIE SECHE GRAVURE IONIQUE REACTIVE ELECTRONIQUE
Keyword (en)
MICROELECTRONIC FABRICATION PLASMA ETCHING QUARTZ DRY PROCESS ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL83X0257895

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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