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A NOVEL POLYIMIDE FILM PREPARATION AND ITS PREFERENTIAL-LIKE CHEMICAL ETCHING TECHNIQUES FOR GAAS DEVICES

Author
HARADA Y; MATSUMOTO F; NAKAKADO T
SANYO ELECTRIC CO. LTD./OSAKA 573/JPN
Source
JOURNAL OF THE ELECTROCHEMICAL SOCIETY; ISSN 0013-4651; USA; DA. 1983; VOL. 130; NO 1; PP. 129-134; BIBL. 6 REF.
Document type
Article
Language
English
Keyword (fr)
IMIDE POLYMERE FILM MATERIAU REVETEMENT PHOTORESIST DISPOSITIF SEMICONDUCTEUR EPAISSEUR UTILISATION HYDRAZINE HYDRATE ETHYLENEDIAMINE CHIMIE MACROMOLECULAIRE POLYMERES
Keyword (en)
POLYIMIDE FILM COATING MATERIAL PHOTORESIST DEVICE SEMICONDUCTOR MATERIALS THICKNESS USE MACROMOLECULAR CHEMISTRY POLYMERS
Keyword (es)
QUIMICA MACROMOLECULAR POLIMEROS
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers

Discipline
Physical chemistry of polymers
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL83X0273259

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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