ELECTRICAL CHARACTERISTICS OF THIN NI2SI, NISI, AND NISI2 LAYERS GROWN ON SILICON
- Other title
- CARACTERISTIQUES ELECTRIQUES DE COUCHES MINCES NI2SI, NISI, ET NISI2 SUR DU SILICIUM (fr)
- Author
- COLGAN EG; MAENPAA M; FINETTI M; NICOLET MA
CALIFORNIA INST. TECHNOLOGY/PASADENA CA 91125/USA - Source
- JOURNAL OF ELECTRONIC MATERIALS; ISSN 0361-5235; USA; DA. 1983; VOL. 12; NO 2; PP. 413-422; BIBL. 16 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- ALLIAGE BINAIRE METAL TRANSITION ALLIAGE DEPOT SOUS VIDE RECUIT NICKEL SILICIUM ALLIAGE NICKEL SILICIURE EPAISSEUR RESISTIVITE ELECTRIQUE CONCENTRATION PORTEUR CHARGE MOBILITE HALL MICROSCOPIE ELECTRONIQUE TRANSMISSION DIFFRACTION RX COUCHE MINCE INTERFACE SOLIDE SOLIDE SILICIUM CONDUCTIVITE ELECTRIQUE EFFET HALL PORTEUR CHARGE SILICIUM!SUB!SEC DIFFUSION COUPLE DIFFUSION DEPOT PHASE VAPEUR DIFFUSION ION ETUDE EXPERIMENTALE ALLIAGE2 NI:>50 SI:15-20 NI2SI METAL PUR NI!SUB!SEC RETRODIFFUSION HELIUM ION ATOMIQUE CRISTALLOGRAPHIE METALLURGIE
- Keyword (en)
- BINARY ALLOY TRANSITION METAL ALLOYS METAL TRANSITION METAL VACUUM DEPOSITION ANNEALING NICKEL SILICON ALLOYS NICKEL SILICIDES THICKNESS ELECTRIC RESISTIVITY CHARGE CARRIER CONCENTRATION HALL MOBILITY TRANSMISSION ELECTRON MICROSCOPY X RAY DIFFRACTION THIN FILM SOLID SOLID INTERFACE NICKEL SILICON ELECTRICAL CONDUCTIVITY HALL EFFECT CARRIER SILICON!SUB!SEC DIFFUSION DIFFUSION PAIR THICKNESS ELECTRON MICROSCOPY VAPOUR DEPOSITION CRISTALLOGRAPHY METALLURGY
- Keyword (es)
- CRISTALOGRAFIA METALURGIA
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Metals. Metallurgy Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL83X0460209
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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