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FORMATION OF DOUBLE DIELECTRIC LAYERS (AL2O3/SIO2) ON SILICON BY D.C. PLASMA ANODIZATION

Author
BECK RB; JAKUBOWSKI A
TECH. UNIV. WARSAW, INST. ELECTRON TECHNOLOGY/WARSAW 00662/POL
Source
THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1982; VOL. 97; NO 1; PP. 63-67; BIBL. 11 REF.
Document type
Article
Language
English
Keyword (fr)
ELECTRONIQUE
Keyword (en)
JUNCTION FIELD EFFECT TRANSISTOR ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL83X0482143

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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