THE INFLUENCE OF SUBSTRATE TEMPERATURE ON THE ORIENTED GROWTH OF NI AND NI2SI ON SI (111)
- Author
- MATTHEIS R
AKAD. WISS. DDR, PHYSIKALISCH-TECH. INST./JENA 6900/DDR - Source
- PHYSICA STATUS SOLIDI. (A). APPLIED RESEARCH; ISSN 0031-8965; DDR; DA. 1983; VOL. 75; NO 1; PP. 195-205; ABS. GER; BIBL. 10 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- NICKEL NICKEL SILICIURE RETRODIFFUSION RUTHERFORD MICROSCOPIE ELECTRONIQUE HAUTE TENSION CROISSANCE CRISTALLINE SUPPORT COUCHE MINCE MICROSTRUCTURE CRISTALLOGRAPHIE
- Keyword (en)
- NICKEL NICKEL SILICIDES RUTHERFORD BACKSCATTERING HIGH VOLTAGE ELECTRON MICROSCOPY CRYSTAL GROWTH SUPPORT THIN FILM MICROSTRUCTURE CRISTALLOGRAPHY
- Keyword (es)
- CRISTALOGRAFIA
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL83X0495519
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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