au.\*:("DONGYIN CUI")
Results 1 to 1 of 1
Selection :
A novel overlay process for imprint lithography using load release and alignment error pre-compensation methodJINYOU SHAO; YUCHENG DING; YIPING TANG et al.Microelectronic engineering. 2008, Vol 85, Num 1, pp 168-174, issn 0167-9317, 7 p.Article
