au.\*:("ERDMANN, A")
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Die weitere Entwicklung technologischer Verfahren der Durchforstung mittelalter Kiefernbestaende. Probleme und Entwicklungstendenzen = Point sur les techniques récentes d'éclaircie de peulemens d'âge moyen de Pinus sylvestris = The recent development of thinning technologies for midle-age Scotch pine stands ― problems and tendenciesERDMANN, A.1985, Vol 19, Num 1, pp 18-24Article
Modellbetrachtungen ueber technologische Verfahren der Durchforstung mittelalter Kiefernbestaende in der DDR = Comparaison de modèles d'éclaircie forestière dans des peuplements d'âge moyen en DDR = Comparison of models regarding technological processes for thinning middle aged pine stands in the GDRERDMANN, A.1986, Vol 20, Num 2, pp 56-61Article
ZU EINEM HAEUFIG BEGANGENEN FEHLER BEIM STATISTISCHEN VERGLEICH VON POPULATIONEN MIT HILFE VON VERTRAUENSINTERVALLEN = A PROPOS D'UNE FAUTE COMMISE FREQUEMMENT DANS LA COMPARAISON STATISTIQUE DE POPULATION A L'AIDE DES INTERVALLES DE CONFIANCEHORN M; ERDMANN A.1978; Z. VERSUCHSTIERKDE; DDR; DA. 1978; VOL. 20; NO 5; PP. 229-232; ABS. ENG; BIBL. 4 REF.Article
The influence of shallow traps on the properties of LiNbO3 waveguidesERDMANN, A.Optics communications. 1992, Vol 93, Num 1-2, pp 44-48, issn 0030-4018Article
Determination of the Dill parameters of thick positive resist for use in modeling applicationsROEDER, G; LIU, S; AYGUN, G et al.Thin solid films. 2011, Vol 519, Num 9, pp 2978-2984, issn 0040-6090, 7 p.Conference Paper
The VRP with pickup and delivery = Le problème de tournées de véhicules avec cueillette et livraisonDESAULNIERS, G; DESROSIERS, J; ERDMANN, A et al.2000, 19 p.Book
UEBER DEN DIURNALEN WACHSTUMSRHYTHMUS VON GEHOLZEN = LES RYTHMES NYCTHEMERAUX DE CROISSANCE DES ARBRESLYR H; HOFFMANN G; ERDMANN A et al.1973; IN: INT. SYMP. BIOL. WOODY PLANTS; NITRA; 1967; BRATISLAVA; SLOVAK ACAD. SCI.; DA. 1973; PP. 419-424; BIBL. 7REF.Conference Paper
DISTRIBUTION FUNCTIONS OF VARIABLES CHARACTERIZING THE MYCELIAL MORPHOLOGY OF STREPTOMYCES HYGROSCOPICUS GROWN IN GLUCOSE-LIMITED CHEMOSTAT CULTURESRIESENBERG D; ERDMANN A; BERGTER F et al.1979; Z. ALLG. MIKROBIOL.; DDR; DA. 1979; VOL. 19; NO 7; PP. 481-487; BIBL. 12 REF.Article
Middle-age teaching : A time of vitality = L'enseignement par les personnes d'un certain âge: le temps de la vitalitéERDMANN, A. B.Harvard educational review. 1998, Vol 68, Num 4, pp 583-587, issn 0017-8055Article
Advanced lithography models for strict process control in the 32 nm technology nodePATSIS, G. P; DRYGIANNAKIS, D; RAPTIS, I et al.Microelectronic engineering. 2009, Vol 86, Num 4-6, pp 513-516, issn 0167-9317, 4 p.Conference Paper
Modeling parameter extraction for DNQ-novolac thick film resistsHENDERSON, C. L; SCHEER, S. A; TSIARTAS, P. C et al.SPIE proceedings series. 1998, pp 256-267, isbn 0-8194-2778-0, 2VolConference Paper
Regulation of lysine excretion in the lysine producer strain Corynebacterium glutamicum MH 20-22BERDMANN, A; WEIL, B; KRÄMER, R et al.Biotechnology letters. 1995, Vol 17, Num 9, pp 927-932, issn 0141-5492Article
Heterodyne interferometer with photorefractive BGO crystalsRODRIGUES, G; KOWARSCHIK, R; ERDMANN, A et al.Journal of modern optics (Print). 1991, Vol 38, Num 11, pp 2203-2219, issn 0950-0340Article
Polarization effects of degenerate four-wave mixing in photorefractive Bi12GeO20 crystalsERDMANN, A; KOWARSCHIK, R; WENKE, L et al.Journal of modern optics (Print). 1988, Vol 35, Num 10, pp 1727-1735, issn 0950-0340Article
Optimization of illumination pupils and mask structures for proximity printingMOTZEK, K; BICH, A; HUDEK, P et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1164-1167, issn 0167-9317, 4 p.Conference Paper
Improved design of magnetooptic rib waveguides for optical isolatorsBAHLMANN, N; CHANDRASEKHARA, V; ERDMANN, A et al.Journal of lightwave technology. 1998, Vol 16, Num 5, pp 818-823, issn 0733-8724Article
Triggering glutamate excretion in Corynebacterium glutamicum by modulating the membrane state with local anesthetics and osmotic gradientsLAMBERT, C; ERDMANN, A; EIKMANNS, M et al.Applied and environmental microbiology (Print). 1995, Vol 61, Num 12, pp 4334-4342, issn 0099-2240Article
K-Cl cotransport, pH, and role of Mg in volume-clamped low-K sheep erythrocytes : three equilibrium statesLAUF, P. K; ERDMANN, A; ADRAGNA, N. C et al.American journal of physiology. Cell physiology. 1994, Vol 35, Num 1, pp C95-C103, issn 0363-6143Article
Feedback effects of degenerate four-wave mixing in crystals of the sillenite familyERDMANN, A; KOWARSCHIK, R; WENKE, L et al.Journal of the Optical Society of America. B, Optical physics (Print). 1989, Vol 6, Num 10, pp 1845-1850, issn 0740-3224Article
Fraesen grosser Verzahnungen mit hartmetallbestueckten Werkzeugen = Milling of large gears with carbide-tipped toolsERDMANN, A; MARXMEIER, R.WT. Werkstattstechnik (1959). 1984, Vol 74, Num 4, pp 223-225, issn 0340-4544Article
Computational algorithms for optimizing mask layouts in proximity printingMOTZEK, K; VOGLER, U; HENNEMEYER, M et al.Microelectronic engineering. 2011, Vol 88, Num 8, pp 2066-2069, issn 0167-9317, 4 p.Conference Paper
Image simulation of projection systems in photolithographyEVANSCHITZKY, P; FÜHNER, T; ERDMANN, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8083, issn 0277-786X, isbn 978-0-8194-8679-0, 80830E.1-80830E.10Conference Paper
Benchmark of a lithography simulation tool for next generation applicationsTOLLKÜHN, B; UHLE, M; FUHRMANN, J et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 1142-1147, issn 0167-9317, 6 p.Conference Paper
Rigorous mask modeling beyond the hopins approachSCHERMER, J; EVANSCHITZKY, P; ERDMANN, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810A.1-62810A.9, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper
Lithographic process simulation for scannersERDMANN, A; ARNZ, M; MAENHOUDT, M et al.SPIE proceedings series. 1998, pp 164-175, isbn 0-8194-2779-9Conference Paper