Challenges of EUVL Resist Process toward Practical ApplicationITO, Shinichi; KIKUCHI, Yukiko; KAWAMURA, Daisuke et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76362V.1-76362V.9, 2Conference Paper

Image Contrast Contributions to Immersion Lithography Defect Formation and Process YieldRATHSACK, Ben; HOOGE, Josh; FOUBERT, Phillipe et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69244W.1-69244W.11, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

193nm immersion process defect generation and reduction mechanism investigation using analytical methodsENOMOTO, Masashi; HATAKEYAMA, Shinichi; NIWA, Takafumi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61533L.1-61533L.10Conference Paper

Finite Element Modeling of PAG Leaching and Water Uptake in Immersion Lithography Resist MaterialsRATHSACK, Ben M; SCHEER, Steven; KUWAHARA, Yuhei et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692315.1-692315.11, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Defect reduction by using a new rinse solution for 193-nm conventional and immersion lithographyMIYAHARA, Osamu; SHIMOAOKI, Takeshi; NAITO, Ryoichiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61533K.1-61533K.13Conference Paper

Studies on immersion defects using mimic immersion experimentsHANAWA, Tetsuro; SUGANAGA, Toshifumi; ISHIBASHI, Takeo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531O.1-61531O.10Conference Paper

CD Uniformity improvement for Double-Patterning Lithography (Litho-Litho-Etch) Using Freezing ProcessSUGIMACHI, Hisanori; KOSUGI, Hitoshi; YAMAGUCHI, Yoshikazu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72731D.1-72731D.7, 2Conference Paper

Optimization of equipment for 193-nm immersion processingNIWA, Takafumi; ENOMOTO, Masashi; SHIMURA, Satoru et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 799-806Conference Paper

Environmental control for lithography with 157-nm exposureKITANO, Junichi; KIBA, Yukio; INAZAWA, Kouichiro et al.SPIE proceedings series. 2002, isbn 0-8194-4435-9, 2Vol, vol 2, 904-910Conference Paper

LWR reduction by novel lithographic and etch techniquesKOBAYASHI, Shinji; SHIMURA, Satoru; VALGIO PRET, Alessandro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763914.1-763914.7, 2Conference Paper

Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defectsRATHSACK, Benjamen; NAFUS, Kathleen; HATAKEYAMA, Shinichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727347.1-72747, 2Conference Paper

Behavior and effects of water penetration in 193-nm immersion lithography process materialsNIWA, Takafumi; SCHEER, Steven; CARCASI, Mike et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651922.1-651922.12, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Molecular contamination control technologies for high volume production phase in high NA 193nm lithographyNAKANO, Toshiro; TANAHASHI, Takashi; IMAI, Akihiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193I.1-65193I.12, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

EUV RLS Performance Tradeoffs for a Polymer Bound PAG ResistGRONHEID, Roel; VAGLIO PRET, Alessandro; RATHSACK, Benjamen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390M.1-76390M.9, 2Conference Paper

Process Development for High Scan Speed ArF immersion LithographyMATSUMURA, Nobuji; SUGIE, Norihiko; ARIMA, Hiroshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230D.1-69230D.10, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Defect transfer from immersion exposure process to post-processing and defect reduction using novel immersion track systemMIYAHARA, Osamu; SHIMOAOKI, Takeshi; WAKAMIZU, Shinya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651924.1-651924.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Molecular contamination control technologies for high NA 193nm lithographyIMAI, Akihiro; TANAHASHI, Takashi; YAMANA, Kazuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 615332.1-615332.12Conference Paper

An investigation on defect-generation conditions in immersion lithographyTOMITA, Tadatoshi; SHIMOAOKI, Takeshi; ENOMOTO, Masashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61533M.1-61533M.12Conference Paper

Behavior of chemically amplified resist defects in TMAH solutionONO, Yuko; MIYAHARA, Osamu; KIBA, Yukio et al.SPIE proceedings series. 2002, isbn 0-8194-4435-9, 2Vol, vol 2, 911-918Conference Paper

Defect analysis in 157-nm photolithography processHORI, Shinya; MIYAHARA, Osamu; KIBA, Yukio et al.SPIE proceedings series. 2002, isbn 0-8194-4435-9, 2Vol, vol 2, 646-652Conference Paper