MODELLVERSUCHE ZUR ELEKTROMAGNETISCHEN JUSTIERUNG DER SUPRALEITENDEN ABSCHIRMLINSE. = ESSAIS ALIGNEMENT DES LENTILLES SUPRACONDUCTRICES BLINDEES PAR DES METHODES ELECTROMAGNETIQUESKNAPEK E.1975; OPTIK; DTSCH.; DA. 1975; VOL. 41; NO 5; PP. 506-514; ABS. ANGL.; BIBL. 8 REF.Article

OBJEKTFREIE PRUEFUNG SUPRALEITENDER ABSCHIRMLINSEN MIT ZWEI VERSCHIEDENEN TELESKOPISCHEN STRAHLENGAENGEN. = VERIFICATION EXEMPTE D'OBJET DE LENTILLES BLINDEES SUPRACONDUCTRICES AVEC DEUX TRAJETS DE RAYONS TELESCOPIQUES DIFFERENTSKNAPEK E.1976; OPTIK; DTSCH.; DA. 1976; VOL. 46; NO 2; PP. 97-106; ABS. ANGL.; BIBL. 16 REF.Article

BEAM DAMAGE TO ORGANIC MATERIAL IS CONSIDERABLY REDUCED IN CRYO-ELECTRON MICROSCOPYKNAPEK E; DUBOCHET J.1980; J. MOLEC. BIOL.; GBR; DA. 1980; VOL. 141; NO 2; PP. 147-161; BIBL. 37 REF.Article

NEW RESULTS ON SUPERCONDUCTING NB-SN SINTER MATERIAL APPLIED FOR ELECTRON MICROSCOPE LENSESKNAPEK E; LEFRANC G.1982; PHYSICA STATUS SOLIDI. (A). APPLIED RESEARCH; ISSN 0031-8965; DDR; DA. 1982; VOL. 73; NO 2; PP. 447-453; ABS. GER; BIBL. 12 REF.Article

HOCHAUFLOESENDE ABBILDUNG BEI NIEDRIGER VERGROESSERUNG IM ELEKTRONENMIKROSKOP MIT SUPRALEITENDEM LINSENSYSTEM = IMAGERIE A HAUTE RESOLUTION AVEC UN FAIBLE GROSSISSEMENT DANS UN MICROSCOPE ELECTRONIQUE AVEC UN SYSTEME DE LENTILLES SUPRACONDUCTRICESBAIER P; KNAPEK E.1982; OPTIK (STUTTG.); ISSN 0030-4026; DEU; DA. 1982; VOL. 61; NO 1; PP. 99-104; ABS. ENG; BIBL. 13 REF.Article

BRIGHT-FIELD IMAGING OF SINGLE HEAVY ATOMS IN AN ELECTRON MICROSCOPE WITH SUPERCONDUCTING LENS SYSTEMFORMANEK H; KNAPEK E.1979; ULTRAMICROSCOPY; NLD; DA. 1979; VOL. 4; NO 1; PP. 77-84; BIBL. 19 REF.Article

INHIBIERUNG DER DURCH KUPFER KATALYSIERTEN OXIDATIVEN ALTERUNG VON POLYOLEFINEN = INHIBITION DU VIEILLISSEMENT DES POLYOLEFINES PAR OXYDATION CATALYSEE PAR LE CUIVREGENTZKOW WV; FORMANEK H; DIETRICH I et al.1983; SIEMENS FORSCHUNGS - UND ENTWICKLUNGSBERICHTE; ISSN 0370-9736; DEU; DA. 1983; VOL. 12; NO 3; PP. 149-154; ABS. ENG; BIBL. 15 REF.Article

RADIATION DAMAGE DUE TO KNOCK-ON PROCESSES ON CARBON FOILS COOLED TO LIQUID HELIUM TEMPERATURE.DIETRICH I; FOX F; HIEDE HG et al.1978; ULTRAMICROSCOPY; NLD; DA. 1978; VOL. 3; NO 2; PP. 185-189; BIBL. 16 REF.Article

REDUCTION OF RADIATION DAMAGE IN AN ELECTRON MICROSCOPE WITH A SUPERCONDUCTING LENS SYSTEMDIETRICH I; FORMANEK H; FOX F et al.1979; NATURE; GBR; DA. 1979; VOL. 277; NO 5695; PP. 380-381; BIBL. 8 REF.Article

New results on superconducting Nb-Sn sinter material applied for electron microscope lenses = Nouveaux résultats sur un matériau fritté supraconducteur Nb-Sn lors de l'emploi de lentilles de microscope électronique = Neue Ergebnisse an supraleitendem Nb-Sn-Sintermaterial beim Einsatz fuer Elektronenmikroskop-LinsenKNAPEK, E; LEFRANC, G.Physica status solidi. A. Applied research. 1982, Vol 73, Num 2, pp 447-453, issn 0031-8965Article

STRUCTURE DETERMINATION OF AN ORGANIC COPPER COMPLEX WITH A "SUPERCONDUCTING ELECTRON MICROSCOPE"DIETRICH I; FORMANEK H; VON GENTZKOW W et al.1982; ULTRAMICROSCOPY; ISSN 0304-3991; NLD; DA. 1982; VOL. 9; NO 1-2; PP. 75-83; BIBL. 13 REF.Article

HOCHAUFLOESENDE ABBIDUNG DURCH SUPRALEITENDES LINSENSYSTEM MIT SEITLICHER OBJEKTEINFUEHRUNG. = IMAGERIE A HAUTE RESOLUTION PAR UN SYSTEME DE LENTILLES SUPRACONDUCTEUR AVEC INTRODUCTION LATERALE DE L'OBJET)DIETRICH I; FOX F; KNAPEK E et al.1976; OPTIK; DTSCH.; DA. 1976; VOL. 45; NO 3; PP. 295-298; ABS. ANGL.; BIBL. 3 REF.Article

Design, CAD-data generation and fabrication of diffractive lenses with submicron feature sizesZARSCHIZKY, H; STEMMER, A; KNAPEK, E et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 175-178, issn 0167-9317Conference Paper

High resolution cryo electron microscopy of specifically stained specimensKNAPEK, E; LEFRANC, G; DIETRICH, I et al.Ultramicroscopy. 1984, Vol 15, Num 3, pp 205-213, issn 0304-3991Article

IMPROVEMENTS IN ELECTRON MICROSCOPY BY APPLICATION OF SUPERCONDUCTIVITY.DIETRICH I; FOX F; KNAPEK E et al.1977; ULTRAMICROSCOPY; NETHERL.; DA. 1977; VOL. 2; NO 2-3; PP. 241-249; BIBL. 8 REF.Article

Application of electron beam lithography for downscaling of SOI-bipolar and BiCMOSSAUTER, M; BERTAGNOLLI, E; KNAPEK, E et al.Microelectronic engineering. 1996, Vol 30, Num 1-4, pp 31-34, issn 0167-9317Conference Paper

Efficiency enhancement of diffractive optical elements by variable relief profilingSTEMMER, A; ZARSCHIZKY, H; KNAPEK, E et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 171-174, issn 0167-9317Conference Paper

Proximity correction using computer aided proximity correction (CAPROX) : evaluation and applicationHINTERMAIER, M; HOFMANN, U; HÜBNER, B et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1991, Vol 9, Num 6, pp 3043-3047, issn 0734-211XConference Paper