Advances in resist materials and processing technology XXIV (26-28 February, 2007, San Jose, California, USA)Lin, Qinghuang.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6638-9, 2 vol, isbn 978-0-8194-6638-9Conference Proceedings

Advances in resist technology and processing XXIII (20-22 February 2006, San Jose, California, USA)Lin, Qinghuang.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, pagination multiple, isbn 0-8194-6196-2Conference Proceedings

A study of process extension technologiesKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193X.1-65193X.6, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

The tri-lateral challenge of resolution, photospeed, and LER : Scaling below 50nm?BRISTOL, R. L.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190W.1-65190W.11, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Marching to the beat of Moore's LawBORODOVSKY, Yan.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615301.1-615301.19Conference Paper

OPC of resist reflow processKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61530Y.1-61530Y.6Conference Paper

Thermal effects study of chemically amplified resistKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61533R.1-61533R.7Conference Paper

Mechanistic model-of line edge roughnessSMITH, Mark D.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61530X.1-61530X.11Conference Paper

New development application method to improve critical dimension controlHONG, Chang-Young.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 615338.1-615338.11Conference Paper

Study of iso/dense bias of BARCs and gap-fill materials on via wafersRUNHUI HUANG.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61532M.1-61532M.8Conference Paper

Lithography beyond 32nm : A role for imprint?MELLIAR-SMITH, Mark.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6638-9, Part I, xxiii-xxxviConference Paper

Rework/stripping of multilayer materials for FEOL and BEOL integration using single wafer tool techniquesTURNER, Stephen.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65192Q.1-65192Q.9, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

The application of high refractive index photoresist for 32nm device level imagingCONLEY, Will.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190Q.1-65190Q.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Enhancing photoresist performance with an adhesion promoting photo-acid generatorSHARMA, Shalini; MEAGLEY, Robert P.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190K.1-65190K.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Emerging patterning materials : Trends, challenges, and opportunities in patterning and materials by designHERR, Daniel J. C.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651903.1-651903.13, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

A multi-tiered approach to 193 nm immersion defect reduction through track process adjustmentsNG, Eugenia; HOOGE, Joshua.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651926.1-651926.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Acidolysis small molecular phenolic ether used as accelerator in photosensitive diazonaphthaquinone systemsHAIHUA ZHOU; YINGQUAN ZOU.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61534J.1-61534J.11Conference Paper

Topside anti-reflective coating process and productivity improvements on KrF lithographyCOUTEAU, Terri; CARCASI, Michael.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61533H.1-61533H.8Conference Paper

Poly(4-(1-hydroxyalkyl)styrene based photoresist materials : Design, synthesis and their lithographic performanceNASRULLAH, Mohammed J; DHAMODHARAN, R.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61532F.1-61532F.8Conference Paper

Self assembly in semiconductor microelectronics : Self-aligned sub-lithographic patterning using diblock copolymer thin filmsBLACK, C. T; RUIZ, R.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615302.1-615302.11Conference Paper

A novel 248-nm wet-developable BARC for trench applicationsNEEF, Charles J; THOMAS, Deborah.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65192Z.1-65192Z.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Thin bilayer resists for 193nm and future photolithography IIHISHIRO, Yoshi; HYATT, Michael.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651935.1-651935.12, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Thin bilayer resists approach for 193nm and future photolithographyHISHIRO, Yoshi; HYATT, Michael.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 61532W.1-61532W.10Conference Paper

Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithographyHINSBERG, William; HOULE, Frances A.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615303.1-615303.11Conference Paper

Everything you ever wanted to know about why the semiconductor industry needs a high refractive index photoresist...But were afraid to ask, part 1CONLEY, Will; SOCHA, Robert.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531L.1-61531L.9Conference Paper