Anisotropic Etching and Nanoribbon Formation in Single-Layer GrapheneCAMPOS, Leonardo C; MANFRINATO, Vitor R; SANCHEZ-YAMAGISHI, Javier D et al.Nano letters (Print). 2009, Vol 9, Num 7, pp 2600-2604, issn 1530-6984, 5 p.Article

Resolution Limits of Electron-Beam Lithography toward the Atomic ScaleMANFRINATO, Vitor R; LIHUA ZHANG; DONG SU et al.Nano letters (Print). 2013, Vol 13, Num 4, pp 1555-1558, issn 1530-6984, 4 p.Article

Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resistMANFRINATO, Vitor R; LIN LEE CHEONG; HUIGAO DUAN et al.Microelectronic engineering. 2011, Vol 88, Num 10, pp 3070-3074, issn 0167-9317, 5 p.Article

Controlled placement of colloidal quantum dots in sub-15 nm clustersMANFRINATO, Vitor R; WANGER, Darcy D; STRASFELD, David B et al.Nanotechnology (Bristol. Print). 2013, Vol 24, Num 12, issn 0957-4484, 125302.1-125302.6Article

Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread FunctionMANFRINATO, Vitor R; JIANGUO WEN; STACH, Eric A et al.Nano letters (Print). 2014, Vol 14, Num 8, pp 4406-4412, issn 1530-6984, 7 p.Article

Neon Ion Beam Lithography (NIBL)WINSTON, Donald; MANFRINATO, Vitor R; BERGGREN, Karl K et al.Nano letters (Print). 2011, Vol 11, Num 10, pp 4343-4347, issn 1530-6984, 5 p.Article