Plasma assisted chemical vapor deposited thin films for microelectronic applicationsNGUYEN, S. V.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1986, Vol 4, Num 5, pp 1159-1167, issn 0734-211XConference Paper

Fluorine diffusion from fluorosilicate glassSHAPIRO, M. J; MATSUDA, T; NGUYEN, S. V et al.Journal of the Electrochemical Society. 1996, Vol 143, Num 7, pp L156-L158, issn 0013-4651Article

New SO₂ resistant mesoporous La-Co-Zr mixed oxide catalysts for hydrocarbon oxidationTRONG ON, D; NGUYEN, S. V; KALIAGUINE, S et al.PCCP. Physical chemistry chemical physics (Print). 2003, Vol 5, Num 12, pp 2724-2729, issn 1463-9076, 6 p.Article

High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuitsNGUYEN, S. V.IBM journal of research and development. 1999, Vol 43, Num 1-2, pp 109-126, issn 0018-8646Article

Q fever pneumonia in children in JapanTO, H; KAKO, N; AKIYAMA, M et al.Journal of clinical microbiology (Print). 1996, Vol 34, Num 3, pp 647-651, issn 0095-1137Article

Ultrathin RTP oxynitride dielectrics on planar, trench and three dimensional structuresNGUYEN, S. V; NGUYEN, T; CARL, D et al.Microelectronics and reliability. 1998, Vol 38, Num 1, pp 81-85, issn 0026-2714Article

Standardization of methods for measuring plasminogen activator inhibitor activity in human plasmaCHANDLER, W. L; SWEE-CHIN LOO; NGUYEN, S. V et al.Clinical chemistry (Baltimore, Md.). 1989, Vol 35, Num 5, pp 787-793, issn 0009-9147, 7 p.Article

Mesoporous silica supported LaCoO₃ perovskites as catalysts for methane oxidationNGUYEN, S. V; SZABO, V; TRONG ON, D et al.Microporous and mesoporous materials. 2002, Vol 54, Num 1-2, pp 51-61, issn 1387-1811Article

Patterns of ancestral human diversity: An analysis of alu-insertion and restriction-site polymorphismsWATKINS, W. S; RICKER, C. E; BAMSHAD, M. J et al.American journal of human genetics. 2001, Vol 68, Num 3, pp 738-752, issn 0002-9297Article

CVD of fluorosilicate glass for ULSI applicationsSHAPIRO, M. J; NGUYEN, S. V; MATSUDA, T et al.Thin solid films. 1995, Vol 270, Num 1-2, pp 503-507, issn 0040-6090Conference Paper

Plasma deposition and characterization of thin silicon-rich silicon nitride filmsNGUYEN, S. V; FRIDMANN, S.Journal of the Electrochemical Society. 1987, Vol 134, Num 9, pp 2324-2329, issn 0013-4651Article

Mono- and bifunctional MFI, BEA and MCM-41 titanium-molecular sieves. Part 1. Synthesis and characterizationTRONG ON, D; NGUYEN, S. V; HULEA, V et al.Microporous and mesoporous materials. 2003, Vol 57, Num 2, pp 169-180, issn 1387-1811, 12 p.Article

The role of inert gases in reactive ion etching of Al₂O₃-TiC (N58) mixed phases for slider air bearing surface patterningNGUYEN, S. V; PEREZ, D; CRAIG, R et al.Proceedings - Electrochemical Society. 1998, pp 115-122, issn 0161-6374, isbn 1-56677-214-1Conference Paper

Rapid method for detection of Coxiella burnetii antibodies using high-density particle agglutinationNGUYEN, S. V; OTSUKA, H; ZHANG, G. Q et al.Journal of clinical microbiology (Print). 1996, Vol 34, Num 12, pp 2947-2951, issn 0095-1137Article

A novel fingered stacked capacitor cellNGUYEN, T; NGUYEN, S. V; DOBUZINSKY, D. M et al.Journal of the Electrochemical Society. 1995, Vol 142, Num 7, pp L111-L113, issn 0013-4651Article

High-flux beam source for cold, slow atoms or moleculesMAXWELL, S. E; BRAHMS, N; DECARVALHO, R et al.Physical review letters. 2005, Vol 95, Num 17, pp 173201.1-173201.4, issn 0031-9007Article

Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuitsCOTE, D. R; NGUYEN, S. V; STAMPER, A. K et al.IBM journal of research and development. 1999, Vol 43, Num 1-2, pp 5-38, issn 0018-8646Article

Clinical evaluation of a new PCR assay for detection of Coxiella burnetii in human serum samplesZHANG, G. Q; NGUYEN, S. V; TO, H et al.Journal of clinical microbiology (Print). 1998, Vol 36, Num 1, pp 77-80, issn 0095-1137Article

Plasma-assisted chemical vapor deposition and characterization of boron nitride filmsNGUYEN, S. V; NGUYEN, T; TREICHEL, H et al.Journal of the Electrochemical Society. 1994, Vol 141, Num 6, pp 1633-1638, issn 0013-4651Article