au.\*:("NODA, Shuichi")
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Fabrication of FinFETs by damage-free neutral-beam etching technologyENDO, Kazuhiko; NODA, Shuichi; MATSUKAWA, Takashi et al.I.E.E.E. transactions on electron devices. 2006, Vol 53, Num 8, pp 1826-1833, issn 0018-9383, 8 p.Article
Investigation of ion transportation in high-aspect-ratio holes from fluorocarbon plasma for SiO2 etchingNODA, Shuichi; OZAWA, Nobuo; KINOSHITA, Takashi et al.Thin solid films. 2000, Vol 374, Num 2, pp 181-189, issn 0040-6090Conference Paper