Alternative lithographic technologies II (23-25 February 2010, San Jose, California, United States)Herr, Daniel J. C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 1 online resource, isbn 978-0-8194-8051-4 0-8194-8051-7Conference Proceedings

Emerging lithographic technologies XII (26-28 February 2008, San Jose, California, USA)Schellenberg, F. M.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7106-2, 2 v, isbn 978-0-8194-7106-2Conference Proceedings

Advances in resist materials and processing technology XXV (25-27 February 2008, San Jose, California, USA)Henderson, Clifford L.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7108-6, 2 v, isbn 978-0-8194-7108-6Conference Proceedings

Advances in resist materials and processing technology XXIV (26-28 February, 2007, San Jose, California, USA)Lin, Qinghuang.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6638-9, 2 vol, isbn 978-0-8194-6638-9Conference Proceedings

UGIM : tenth biennial university/government/industry microelectronics symposium (Research Triangle Park NC, May 18-19, 1993)Biennial university/government/industry microelectronics symposium. 1993, isbn 0-7803-0991-X, X, 253 p, isbn 0-7803-0991-XConference Proceedings

UGIM : ninth biennial university/government/industry microelectronics symposium, June 12-14, 1991, Melbourne FLBiennial university/government/industry microelectronics symposium. 1991, isbn 0-7803-0109-9, 262 p., isbn 0-7803-0109-9Conference Proceedings

Extreme ultraviolet (EUV) lithography (22-25 February 2010, San Jose, California, United States)La Fontaine, Bruno M.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 2 vol, 2, isbn 978-0-8194-8050-7 0-8194-8050-9Conference Proceedings

Advances in resist materials and processing technology XXVI (23-25 February 2009, San Jose, California, United States)Henderson, Clifford L.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 2 vol, 2, isbn 978-0-8194-7526-8 0-8194-7526-2Conference Proceedings

Optical microlithography XXIII (23-25 February 2010, San Jose, California, United States)Dusa, Mircea V; Conley, Willard.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 2 vol, 2, isbn 978-0-8194-8054-5 0-8194-8054-1Conference Proceedings

16nm with 193nm Immersion Lithography and Double ExposureAXELRAD, Valery; SMAYLING, Michael C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7641, issn 0277-786X, isbn 978-0-8194-8055-2 0-8194-8055-X, 764109.1-764109.6Conference Paper

A Non-Delta-Chrome OPC Methodology for Process Models with Three-Dimensional Mask EffectsNG, Philip C. W; TSAI, Kuen-Yu; TANG, Chih-Hsien et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76402P.1-76402P.7, 2Conference Paper

A Simplified Reaction-diffusion System of Chemically-Amplified Resist Process Modeling for OPCYONGFA FAN; JEONG, Moon-Gyu; HUANG, Jason et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764039.1-764039.11, 2Conference Paper

Applications of MoSi-based Binary Intensity Mask for Sub-40nm DRAMEOM, Tae-Seung; SHIN, Eun-Kyoung; SUN, Kyu-Tae et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76402J.1-76402J.9, 2Conference Paper

Assessing out-of-band flare effects at the wafer level for EUV lithographyGEORGE, Simi A; NAULLEAU, Patrick P; KEMP, Charles D et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 763626.1-763626.10, 2Conference Paper

Automation of Sample Plan Creation for Process Model CalibrationOBERSCHMIDT, James; ABDO, Amr; DESOUKY, Tamer et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401G.1-76401G.9, 2Conference Paper

CMOS Process Compatible Directed Block Copolymer Self-Assembly for 20 nm Contact Holes and BeyondCHANG, Li-Wen; BAO, Xin-Yu; WONG, H.-S. Philip et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370I.1-76370I.9Conference Paper

Conventional and reversed image printing in electron beam direct write lithography with proximity effect corrections based on dose and shape modificationCHOI, Kang-Hoon; GUTSCH, Manuela; FREITAG, Martin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370W.1-76370W.7Conference Paper

Debris Measurement at the Intermediate Focus of a Laser-Assisted Discharge-Produced Plasma Light SourceSPORRE, J; SURLA, V; NEUMANN, M. J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 763611.1-763611.12, 2Conference Paper

Development and performance of grazing and normal incidence collectors for the HVM DPP and LPP sourcesBIANUCCI, G; BRAGHERI, A; CASSOL, G. L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76360C.1-76360C.9, 2Conference Paper

Development of EUV resist for 22 nm half pitch and beyondMARUYAMA, Ken; SHIMIZU, Makoto; HIRAI, Yuuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76360T.1-76360T.8, 2Conference Paper

Development of a Design Intent Extraction Flow for Mask ManufacturingKATO, Kokoro; ENDO, Masakazu; INOUE, Tadao et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7641, issn 0277-786X, isbn 978-0-8194-8055-2 0-8194-8055-X, 76410K.1-76410K.8Conference Paper

Development of an Ultrasonic System for Super-Precise Measurement of Zero-CTE Temperature of EUVL-Grade TiO₂-SiO₂ Ultra-Low-Expansion GlassesKUSHIBIKI, Jun-Ichi; ARAKAWA, Mototaka; OHASHI, Yuji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76362M.1-76362M.8, 2Conference Paper

Direct Write 3-Dimensional Nanopatterning using ProbesPIRES, David; KNOLL, Armin; DUERIG, Urs et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76371E.1-76371E.7Conference Paper

Electron-beam directed materials assemblyKINGSBOROUGH, Richard P; GOODMAN, Russell B; ASTOLFI, David et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370N.1-76370N.43Conference Paper

Evaluation Results of a New EUV Reticle Pod based on SEMI E152OTA, Kazuya; YONEKAWA, Masami; TAGUCHI, Takao et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76361F.1-76361F.11, 2Conference Paper