au.\*:("SHIOGUCHI, Masaharu")
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Impact of air-borne NH3 and humidity against wafer-to-wafer CD variation in ArF lithography through 45nm technology nodeNAITO, Ryoichiro; MATSUDA, Yoshitaka; SHIOGUCHI, Masaharu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193D.1-65193D.6, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper
Molecular contamination control technologies for high volume production phase in high NA 193nm lithographyNAKANO, Toshiro; TANAHASHI, Takashi; IMAI, Akihiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193I.1-65193I.12, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper
Molecular contamination control technologies for high NA 193nm lithographyIMAI, Akihiro; TANAHASHI, Takashi; YAMANA, Kazuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 2, 615332.1-615332.12Conference Paper