Improvement of performance deviation and productivity of MOSFETs with gate length below 30 nm by flash lamp annealingNISHINOHARA, Kazumi T; ITO, Takayuki; SUGURO, Kyoichi et al.IEEE transactions on semiconductor manufacturing. 2004, Vol 17, Num 3, pp 286-291, issn 0894-6507, 6 p.Conference Paper

High performance damascene gate CMOSFETs with recessed Channel formed by Plasma Oxidation and Etching Method (RC-POEM)MATSUO, Kouji; SEKINE, Katsuyuki; SAITO, Tomohiro et al.IEDm : international electron devices meeting. 2002, pp 445-448, isbn 0-7803-7462-2, 4 p.Conference Paper

Stencil mask ion implantation technology : Special section on issues related to semiconductor manufacturing at technology nodes below 70 nmSHIBATA, Takeshi; SUGURO, Kyoichi; SUGIHARA, Kazuyoshi et al.IEEE transactions on semiconductor manufacturing. 2002, Vol 15, Num 2, pp 183-188, issn 0894-6507Article

Highly reliable CVD-WSi metal gate electrode for nMOSFETsNAKAJIMA, Kazuaki; NAKAZAWA, Hiroshi; SEKINE, Katsuyuki et al.I.E.E.E. transactions on electron devices. 2005, Vol 52, Num 10, pp 2215-2219, issn 0018-9383, 5 p.Article

Ultra-shallow junction formation by low energy ion implantation and flash lamp annealingSUGURO, Kyoichi; ITO, Takayuki; ITANI, Takaharu et al.Proceedings - Electrochemical Society. 2003, pp 253-259, issn 0161-6374, isbn 1-56677-376-8, 7 p.Conference Paper

Application of ultra-rapid thermal annealing for electrical activation for next generation MOSFETsSUGURO, Kyoichi; ITO, Takayuki; NISHINOHARA, Kazumi et al.Proceedings - Electrochemical Society. 2004, pp 39-49, issn 0161-6374, isbn 1-56677-406-3, 11 p.Conference Paper

Low-resistance ultrashallow extension formed by optimized flash lamp annealingITO, Takayuki; SUGURO, Kyoichi; MURAYAMA, Hiromi et al.IEEE transactions on semiconductor manufacturing. 2003, Vol 16, Num 3, pp 417-422, issn 0894-6507, 6 p.Conference Paper

Lithographyless ion implantation technology for agile fabNISHIHASHI, Tsutomu; KASHIMOTO, Kazuhiro; TSUNODA, Michio et al.IEEE transactions on semiconductor manufacturing. 2002, Vol 15, Num 4, pp 464-469, issn 0894-6507, 6 p.Conference Paper