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THE CELLULAR REACTION IN PB-SN ALLOYSTU KN.1972; METALLURG. TRANS.; U.S.A.; DA. 1972; VOL. 3; NO 11; PP. 2769-2775; BIBL. 30 REF.Serial Issue

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X-RAY STUDY OF INTERDIFFUSION IN BIMETALLIC CU-AU FILMSTU KN; BERRY BS.1972; J. APPL. PHYS.; U.S.A.; DA. 1972; VOL. 43; NO 8; PP. 3283-3290; BIBL. 22 REF.Serial Issue

KINETICS OF INTERFACIAL REACTION IN BIMETALLIC CU-SN THIN FILMSTU KN; THOMPSON RD.1982; ACTA METALL.; USA; DA. 1982-05; VOL. 30; NO 5; PP. 947-952; BIBL. 16 REF.Article

SHALLOW SILICIDE-TO-SILICON CONTACTS: THE CASE OF AMORPHOUS-PD₈₀SI₂₀-TO-SILICONKRITZINGER S; TU KN.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 37; NO 2; PP. 205-208; BIBL. 9 REF.Article

ANALYSIS OF PARALLEL SCHOTTKY CONTACTS BY DIFFERENTIAL INTERNAL PHOTOEMISSION SPECTROSCOPYOKUMURA T; TU KN.1983; JOURNAL OF APPLIED PHYSICS; ISSN 0021-8979; USA; DA. 1983; VOL. 54; NO 2; PP. 922-927; BIBL. 14 REF.Article

PARALLEL SILICIDE CONTACTSOHDOMARI I; TU KN.1980; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1980; VOL. 51; NO 7; PP. 3735-3739; BIBL. 5 REF.Article

FORBIDDEN 200 DIFFRACTION SPOTS IN SILICON.TU KN; HOWIE A.1978; PHILOS MAG., B; G.B.; DA. 1978; VOL. 37; NO 1; PP. 73-81; BIBL. 8 REF.Article

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THIN PALLADIUM SILICIDE CONTACTS TO SILICONKRITZINGER S; TU KN.1981; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1981; VOL. 52; NO 1; PP. 305-310; BIBL. 12 REF.Article

ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY DIFFRACTION.MAYER JW; TU KN.1974; J. VACCUM SCI. TECHNOL.; U.S.A.; DA. 1974; VOL. 11; NO 1; PP. 86-93; BIBL. 35 REF.; (20TH NATL. SYMP. AM. VAC. 50C. 11TH CONF. MICROBALANCE TECH. PROC.; NEW YORK; 1973)Conference Paper

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KINETICS OF INTERFACIAL REACTION IN BIMETALLIC CU-SN THIN FILMS = CINETIQUE COUCHES MINCES BIMETALLIQUES CU-SNTU KN; THOMPSON RD.1982; ACTA METALL.; ISSN 0001-6160; USA; DA. 1982; VOL. 30; NO 5; PP. 947-952; ABS. FRE/GER; BIBL. 16 REF.Article

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MASS TRANSPORT IN LAYERED POLYCRYSTALLINE THIN FILMSTU KN; ROSENBERG R.1972; THIN SOLID FILMS; NETHERL.; DA. 1972; VOL. 13; NO 1; PP. 163-167; BIBL. 10 REF.Serial Issue

FORMATION AND SCHOTTKY BEHAVIOR OF MANGANESE SILICIDES ON N-TYPES SILICONEIZENBERG M; TU KN.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 10; PP. 6885-6890; BIBL. 26 REF.Article