Die kantonale Autobahn T6 Schönbühl-Lyss = L'autoroute cantonale T6 Schönbühl-LyssVETTINGER, P.Strasse und Verkehr. 1987, Num 6, pp 396-399, issn 0039-2189Article

Micro- and nanoengineering 94LEHMANN, H. W; STAUFER, U; VETTINGER, P et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, issn 0167-9317, 577 p.Conference Proceedings

Neural networks application for fast, direct correction kernel generation for proximity effects correction in electron beam lithographyJEDRASIK, P.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 191-194, issn 0167-9317Conference Paper

Voltage contrast maps using the time-dispersive electron spectrometerDINNIS, A. R.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 523-526, issn 0167-9317Conference Paper

Multi-level-patterning using ion species of different penetration depthBUCHMANN, L.-M.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 335-338, issn 0167-9317Conference Paper

The nanometer age: challenge and chanceROHRER, H.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 3-15, issn 0167-9317Conference Paper

Micromachining by accelerated nanoparticle erosionGSPANN, J.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 517-520, issn 0167-9317Conference Paper

0.35 μm pattern fabrication using quartz-etch attenuate phase-shifting mask in an I-line stepper with a 0.50 NA and a 0.60 sigmaWEN-AN LOONG; SHYI-LONG SHY; YUNG-CHI LIN et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 275-278, issn 0167-9317Conference Paper

A single quality factor for electron backscattering from thin filmsMESSINA, G; PAOLETTI, A; SANTANGELO, S et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 183-186, issn 0167-9317Conference Paper

Challenges for 0.35-0.25 μm optical lithographyVAN DEN HOVE, L; RONSE, K.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 357-365, issn 0167-9317Conference Paper

DUV lithography for 0.35 μm CMOS processingVAN DRIESSCHE, V; GOETHALS, A.-M; OP DE BEECK, M et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 243-246, issn 0167-9317Conference Paper

Design and analysis of diffraction mirror optics for EUV projection lithographyFUKUDA, H; TERASAWA, T.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 239-242, issn 0167-9317Conference Paper

Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanesLERCEL, M. J; REDINBO, G. F; ROOKS, M et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 43-46, issn 0167-9317Conference Paper

Gap control in the fabrication of quantum-effect devices using X-ray nanolithographyBURKHARDT, M; SILVERMAN, S; SMITH, H. I et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 307-310, issn 0167-9317Conference Paper

Micromechanical structures for data storageREILEY, T. C; FAN, L.-S; MAMIN, H. J et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 495-498, issn 0167-9317Conference Paper

Multilayer coated reflective optics for Extreme UV lithographyLOUIS, E; VOORMA, H.-J; KOSTER, N. B et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 235-238, issn 0167-9317Conference Paper

Nanostructures self-assembling from nonequilibrium silver nanophase on conducting nonmetallic substratesRAGOISHA, G. A; GURIN, V. S; ROGACH, A. L et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 51-54, issn 0167-9317Conference Paper

Non-conventional techniques for optical lithographyDÄNDLIKER, R; GRAY, S; CLUBE, F et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 205-211, issn 0167-9317Conference Paper

New KrF and ArF excimer laser for advanced DUV lithographyENDERT, H; PÄTZEL, R; POWELL, M et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 221-224, issn 0167-9317Conference Paper

Proximity correction for high CD accuracy and process toleranceWAAS, T; EISENMANN, H; VÖLLINGER, O et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 179-182, issn 0167-9317Conference Paper

Simulation of single electron circuitsRÖSNER, W; HOFMANN, F; VOGELSANG, T et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 55-58, issn 0167-9317Conference Paper

The impact of polarized illumination on imaging characteristics in optical microlithographyBÖRNIG, K; HENKE, W.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 217-220, issn 0167-9317Conference Paper

Transmission and side-lobe effect in attenuated phase shift masksZHENG CUI; PREWETT, P. D; JOHNSON, S et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 259-262, issn 0167-9317Conference Paper

A new mechanism of nanostructure formation with the STMGRATZKE, U; SIMON, G.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 35-38, issn 0167-9317Conference Paper

Doping profiling with scanning surface harmonic microscopyJOHNSON, M. B; BOURGOIN, J.-P; MICHEL, B et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 539-542, issn 0167-9317Conference Paper