Optical imaging in projection microlithographyWong, Alfred Kwok-Kit.Tutorial texts in optical engineering. 2005, issn 1017-6993, isbn 0-8194-5829-5, 1Vol, XIX- 254 p, isbn 0-8194-5829-5Book

Design for manufacturability through design-process integration (28 February-2 March 2007, San Jose, California, USA)Wong, Alfred Kwok-Kit; Singh, Vivek K.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6640-2, 1 v. (various pagings), isbn 978-0-8194-6640-2Conference Proceedings

Intelligent visualization of lithography violationsZIGER, David.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211E.1-65211E.10, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

More on accelerating physical verification using STPRL : a novel language for test pattern generationNOUH, Ahmed.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211T.1-65211T.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

DRC plus : Augmenting standard DRC with pattern matching on 2D geometriesDAI, Vito; JIE YANG; RODRIGUEZ, Norma et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210A.1-65210A.12, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

OPC to reduce variability of transistor propertiesKOIKE, Kaoru; NAKAYAMA, Kohichi; OGAWA, Kazuhisa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210J.1-65210J.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Prediction of interconnect delay variations using pattern matchingCHIN, Eric Y; HOLWILL, Juliet A; NEUREUTHER, Andrew R et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210I.1-65210I.6, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Statistical analysis of gate CD variation for yield optimizationHOLWILL, Juliet; KYE, Jongwook; YI ZOU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211P.1-65211P.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

A rigorous method to determine printability of a target layoutYENIKAYA, Bayram; SEZGINER, Apo.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652112.1-652112.12, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Assist features for modeling three-dimensional mask effects in Optical Proximity CorrectionQILIANG YAN; ZHIJIE DENG; SHIELY, James et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211M.1-65211M.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Automated full-chip hotspot detection and removal flow for interconnect layers of cell-based designsROSEBOOM, Ed; ROSSMAN, Mark; CHANG, Fang-Cheng et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210C.1-65210C.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Automatic OPC mask shape repairWORD, James; DUDAU, Draeos; COBB, Nick et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211G.1-65211G.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Design for manufacturing approach to second level alternating phase shift mask patterningHENRICHS, Sven; CHANDRAMOULI, Mahesh; MIN CHUN TSAI et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211W.1-65211W.6, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

DRC and mask friendly pattern and probe aberration monitorsHOLWILL, Juliet; NEUREUTHER, Andrew R.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211U.1-65211U.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Double patterning technology : Process-window analysis in a many-dimensional spaceSEZGINER, Apo; YENIKAYA, Bayram.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652113.1-652113.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Ensuring production-worthy OPC recipes using large test structure arravsCORK, Christopher; ZIMMERMANN, Rainer; XIN MEI et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211D.1-65211D.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Intelligent fill pattern and extraction methodology for sensitive RF/analog or SoC productsBALASINSKI, A; CETIN, J; KAHNG, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652115.1-652115.7, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Mask manufacturing rules checking (MRC) as a DFM strategyBUCK, Peter; GLADHILL, Richard; STRAUB, Joseph et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211V.1-65211V.5, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Novel method for quality assurance of two-dimensional pattern fidelityMAEDA, Shimon; OGAWA, Ryuji; SHIBAZAKI, Seiji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211B.1-65211B.10, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Novel technique to separate systematic and random defects during 65 nm and 45nm process developmentYEH, J. H; PARK, Allen.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652114.1-652114.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Structural failure prediction using simplified lithography simulation modelsNIEDERMAIER, P; ROESSLER, T.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652107.1-652107.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Wire sizing and spacing for lithographic printability optimizationKE CAO; JIANG HU; MOSONG CHENG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652111.1-652111.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Boundary-based cellwise OPC for standard-cell layoutsPAWLOWSKI, David M; LIANG DENG; WONG, Martin D. F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211O.1-65211O.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Scanner parameter sensitivity analysis for OPEMATSUYAMA, Tomoyuki; NAKASHIMA, Toshiharu; FUJIWARA, Tomoharu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652116.1-652116.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Process window aware layout optimization using hot soot fixing systemKOBAYASHI, Sachiko; KYOH, Suigen; KOTANI, Toshiya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210B.1-65210B.10, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper