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Results 1 to 25 of 824

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Advanced fabrication of Si nanowire FET structures by means of a parallel approachLI, J; PUD, S; MAYER, D et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 27, issn 0957-4484, 275302.1-275302.7Article

Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread FunctionMANFRINATO, Vitor R; JIANGUO WEN; STACH, Eric A et al.Nano letters (Print). 2014, Vol 14, Num 8, pp 4406-4412, issn 1530-6984, 7 p.Article

Fabrication and characterization of SiGe coaxial quantum wells on ordered Si nanopillarsZILONG WU; HUI LEI; TONG ZHOU et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 5, issn 0957-4484, 055204.1-055204.6Article

Fabrication of highly ordered Ta2O5 and Ta3Ns nanorod arrays by nanoimprinting and through-mask anodizationYANBO LI; NAGATO, Keisuke; DELAUNAY, Jean-Jacques et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 1, issn 0957-4484, 014013.1-014013.8Article

Fabrication of silicon molds with multi-level, non-planar, micro- and nano-scale featuresAZIMI, S; DANG, Z. Y; ANSARI, K et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 37, issn 0957-4484, 375301.1-375301.11Article

Interaction and dynamics of ambient water adlayers on graphite probed using AFM voltage nanolithography and electrostatic force microscopyGOWTHAMI, T; KURRA, Narendra; RAINA, Gargi et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 15, issn 0957-4484, 155304.1-155304.9Article

Magnetically Actuated Liquid CrystalsMINGSHENG WANG; LE HE; ZORBA, Serkan et al.Nano letters (Print). 2014, Vol 14, Num 7, pp 3966-3971, issn 1530-6984, 6 p.Article

Plasmon-Phonon Coupling in Large-Area Graphene Dot and Antidot Arrays Fabricated by Nanosphere LithographyXIAOLONG ZHU; WEIHUA WANG; WEI YAN et al.Nano letters (Print). 2014, Vol 14, Num 5, pp 2907-2913, issn 1530-6984, 7 p.Article

Removal of UV-cured resin using a hybrid cleaning process for nanoimprint lithographyKIM, Min-Su; KANG, Bong-Kyun; RAMACHANDRAN, Manivannan et al.Microelectronic engineering. 2014, Vol 114, pp 126-130, issn 0167-9317, 5 p.Article

Shrinking-Hole Colloidal Lithography: Self-Aligned Nanofabrication of Complex Plasmonic NanoantennasSYRENOVA, Svetlana; WADELL, Carl; LANGHAMMER, Christoph et al.Nano letters (Print). 2014, Vol 14, Num 5, pp 2655-2663, issn 1530-6984, 9 p.Article

Bolometer detection of magnetic resonances in nanoscaled objectsROD, Irina; MECKENSTOCK, Ralf; ZÄHRES, Horst et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 42, issn 0957-4484, 425302.1-425302.8Article

Fabrication of a plasmonic modulator incorporating an overlaid grating couplerHASSAN, Sa'ad; LISICKA-SKRZEK, Ewa; OLIVIERI, Anthony et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 49, issn 0957-4484, 495202.1-495202.9Article

Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithographyHUI ZHANG; HUDA, Miftakhul; KOMORI, Takuya et al.Microelectronic engineering. 2014, Vol 121, pp 142-146, issn 0167-9317, 5 p.Article

Measurements of flow distribution in a thin resin layer during ultraviolet nanoimprint lithography by means of digital holographic particle-tracking velocimetryUNNO, Noriyuki; SATAKE, Shin-Ichi; TANIGUCHI, Jun et al.Microelectronic engineering. 2014, Vol 123, pp 187-191, issn 0167-9317, 5 p.Conference Paper

Nanoimprinted DWDM laser arrays on indium phosphide substratesSMISTRUP, Kristian; NØRREGAARD, Jesper; RISHTON, Stephen et al.Microelectronic engineering. 2014, Vol 123, pp 149-153, issn 0167-9317, 5 p.Conference Paper

A General Method To Measure the Hall Effect in Nanowires: Examples of FeS2 and MnSiDEGRAVE, John P; DONG LIANG; SONG JIN et al.Nano letters (Print). 2013, Vol 13, Num 6, pp 2704-2709, issn 1530-6984, 6 p.Article

Automatic detection of NIL defects using microscopy and image processingPIETROY, David; GEREIGE, Issam; GOURGON, Cécile et al.Microelectronic engineering. 2013, Vol 112, pp 163-167, issn 0167-9317, 5 p.Article

Dependence of the fused-silica etch rate on the etch mask opening diameterKIMMLE, Christina; WOLFF, Sandra; DOERING, Christoph et al.Microelectronic engineering. 2013, Vol 112, pp 10-13, issn 0167-9317, 4 p.Article

Direct imprint of nanostructures in metals using porous anodic alumina stampsXIANZHONG LANG; TENG QIU; KAILIN LONG et al.Nanotechnology (Bristol. Print). 2013, Vol 24, Num 25, issn 0957-4484, 255303.1-255303.5Article

Direct-write 3D nanolithography at cryogenic temperaturesBRESIN, M; TOTH, M; DUNN, K. A et al.Nanotechnology (Bristol. Print). 2013, Vol 24, Num 3, issn 0957-4484, 035301.1-035301.7Article

Fabrication and characterization of copper interconnects of line-width down to 100 nm using a specially designed phase shift maskROY, Arijit.Microelectronic engineering. 2013, Vol 113, pp 152-156, issn 0167-9317, 5 p.Article

Fabrication of hierarchical micro-nanotopographies for cell attachment studiesLOPEZ-BOSQUE, M. J; TEJEDA-MONTES, E; CAZORLA, M et al.Nanotechnology (Bristol. Print). 2013, Vol 24, Num 25, issn 0957-4484, 255305.1-255305.12Article

Geometry of nanopore devices fabricated by electron beam lithography: Simulations and experimental comparisonsAHMADI, Amir G; NAIR, Sankar.Microelectronic engineering. 2013, Vol 112, pp 149-156, issn 0167-9317, 8 p.Article

Influence of the photothermal effect of a gold nanorod cluster on biofilm disinfectionJO, Wonjin; MIN JUN KIM.Nanotechnology (Bristol. Print). 2013, Vol 24, Num 19, issn 0957-4484, 195104.1-195104.8Article

Linear and Nonlinear Optical Characterization of Aluminum NanoantennasSCHWAB, Patrick M; MOOSMANN, Carola; WISSERT, Matthias D et al.Nano letters (Print). 2013, Vol 13, Num 4, pp 1535-1540, issn 1530-6984, 6 p.Article

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