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Computational model of reactive sputteringKOSS, V. A; IOFFE, I. V; BELKIND, A et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 3, pp 701-703, issn 0734-2101Article

Deposition rates in direct current diode sputteringSTUTZIN, G. C; ROZSA, K; GALLAGHER, A et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 3, pp 647-656, issn 0734-2101Article

Copper metalorganic chemical vapor deposition reactions of hexafluoroacetylacetonate Cu(I) vinyltrimethylsilane and bis (hexafluorocetylacetonate) Cu(II) adsorbed on titanium nitrideDONNELLY, V. M; GROSS, M. E.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 1, pp 66-77, issn 0734-2101Article

Design and characterization of a compact two-target ultrahigh vacuum magnetron sputter deposition system : application to the growth of epitaxial Ti1-xAlxN alloys and TiN/Ti1-xAl1N superlatticesADIBI, F; PETROV, I; GREENE, J. E et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 1, pp 136-142, issn 0734-2101Article

Electric current oscillations in a parallel-plate plasma reactorSEEBÖCK, R. J; DEUTSCH, R; RÄUCHLE, E et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 3, pp 682-688, issn 0734-2101Article

Electromagnetic fields in a radio-frequency induction plasmaHOPWOOD, J; GUARNIERI, C. R; WHITEHAIR, S. J et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 1, pp 147-151, issn 0734-2101Article

Etching of zinc selenide and zinc telluride epitaxial films in a secondary afterglow plasma : a statistical experimental design studySCHÄFER, P; HOFFMANN, N; PARTHIER, L et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 3, pp 621-625, issn 0734-2101Article

In situ infrared measurements of film and gas properties during the plasma deposition of amorphous hydrogenated siliconMORRISON, P. W; HAIGIS, J. R.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 3, pp 490-502, issn 0734-2101Article

Langmuir probe measurements of a radio frequency induction plasmaHOPWOOD, J; GUARNIERI, C. R; WHITEHAIR, S. J et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 1, pp 152-156, issn 0734-2101Article

Observation of oxygen enrichment in zirconium oxide filmsKHAWAJA, E. E; BOUAMRANE, F; HALLAK, A. B et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 3, pp 580-587, issn 0734-2101Article

Reflection high-energy electron diffraction intensity monitored homoepitaxial growth of SrTiO3 buffer layer by pulsed laser depositionCHERN, M. Y; GUPTA, A; HUSSEY, B. W et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 3, pp 637-641, issn 0734-2101Article

Refrigerator-cooled bakeable-type cryopump at 3 K for extremely high vacuumMATSUI, Y; OHZORA, H; YAMAKAWA, H et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 2, pp 422-425, issn 0734-2101Article

Treatment of the wall materials of extremely high vacuum chamber for dynamical surface analysisTSUKUI, K; HASUNUMA, R; ENDO, K et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 2, pp 417-421, issn 0734-2101Article

Comparison of TiAlN coatings grown by unbalanced magnetron and arc bond sputtering techniquesMÜNZ, W.-D; HURKMANS, T; KEIREN, G et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 5, pp 2583-2589, issn 0734-2101Article

Comparison of magnetron sputter deposition conditions in neon, argon, krypton, and xenon dischargesPETROV, I; IVANOV, I; ORLINOV, V et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 5, pp 2733-2741, issn 0734-2101Article

Conversion electron Mössbauer characterization of Fe-Ti and Fe-TiN interfaces in dependence on pretreatments and bias voltage in physical vapor depositionHANZEL, D; HANZEL, D et al.MEISEL, W; HANZEL, D; HANZEL, D et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 6, pp 3034-3039, issn 0734-2101Article

Design of an ultrahigh vacuum direct-drive, cryogenic sample manipulator providing two degrees of rotational freedomBRAUN, R. M; WINOGRAD, N.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 5, pp 2867-2870, issn 0734-2101Article

Enhanced tribological performances of rigid disk by using chemically bonded lubricantLEE, H. J; ZUBECK, R; HOLLARS, D et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 3, pp 711-714, issn 0734-2101Article

High quality Y1Ba2Cu3O7-δ ultrathin films produced in situ by high growth rate chemical vapor depositionLING CHEN; SCHMIDT, B. E; KALOYEROS, A. E et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 2, pp 454-457, issn 0734-2101Article

Radio-frequency magnetron sputtering of pure and mixed targets of Li4SiO4, Li3PO4, and Li2ODUDNEY, N. J; BATES, J. B; ROBERTSON, J. D et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 2, pp 377-389, issn 0734-2101Article

Serial cosputtering of some metal alloys : enhancement of partial sputtering yields of light metalsBELKIND, A; ORBAN, Z; BERG, S et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 2, pp 314-318, issn 0734-2101Article

Time-resolved spectroscopic studies of the ultraviolet-laser photolysis of aluminum bromide for Al film growthKARASAWA, T; BRAMBLETT, T. R; LUBBEN, D et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 2, pp 301-306, issn 0734-2101Article

Electronic and optical properties of room temperature sputter deposited indium tin oxideLEE, S. B; PINCENTI, J. C; COCCO, A et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 5, pp 2742-2746, issn 0734-2101Article

Film deposition with a facing magnets magnetron sputtering methodQIHUA FAN; XIAOHONG CHEN; HONGHYOU CHEN et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 6, pp 3130-3132, issn 0734-2101Article

Gold wire sealing method of stainless-steel/aluminum-alloy joint for thermal isolation at liquid-nitrogen temperatureSHIMOSHIKIRYO, F; TAKAKUWA, Y; OYAMA, N et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 5, pp 2874-2875, issn 0734-2101Article

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