Evolution des dépôts par voie sèche (PVD et CVD) = Evolution of dry coatings (PVD and CVD)ZEGA, B.Le Vide, les couches minces. 1986, Num 232, pp 3-12, issn 0223-4335Conference Paper

Vapour deposition of engineering coatings = Dépôt en phase vapeur des revêtements technologiquesEDWARDS, J.Transactions of the Institute of Metal Finishing. 1986, Vol 64, Num 4, pp 17-23, issn 0020-2967Article

Vapor phase propylene epoxidation kineticsQIAN, G; YUAN, Y. H; WU, W et al.Studies in surface science and catalysis. 2006, pp 333-336, issn 0167-2991, isbn 0-444-51733-2, 4 p.Conference Paper

Conformal vapor phase growth of submicron thick (100) GaAs filmsPRIBAT, D; COLLET, C; LEGAGNEUX, P et al.Applied physics letters. 1990, Vol 56, Num 20, pp 2007-2009, issn 0003-6951Article

Crystalline CrV_0.95P_0.05O₄ catalyst for the vapor-phase oxidation of picolinesTAKEHIRA, K; SHISHIDO, T; SONG, Z et al.Catalysis today. 2004, Vol 91-92, pp 7-11, issn 0920-5861, 5 p.Conference Paper

Oxi-condensation of n-pentane to phthalic anhydrideCENTI, G; BURATTINI, M; TRIFIRO', F et al.Applied catalysis. 1987, Vol 32, Num 1-2, pp 353-356, issn 0166-9834Article

Growth velocity variations during metalorganic vapor phase epitaxy through an epitaxial shadow maskDEMEESTER, P; BUYDENS, L; VAN DAELE, P et al.Applied physics letters. 1990, Vol 57, Num 2, pp 168-170, issn 0003-6951Article

P.V.D. hard coatings: new dimension in surface technology = Revêtements durs par dépôt physique en phase vapeur: une nouvelle dimension en technologie de surfaceMUENZ, W. D.Le Vide, les couches minces. 1986, Num 232, pp 13-25, issn 0223-4335Conference Paper

Les dépôts chimiques à partir d'une phase gazeuse: exemples de réalisations = Chemical vapor deposition: examples of realizationsAUDISIO, S; MAZILLE, H.Le Vide, les couches minces. 1986, Num 232, pp 39-45, issn 0223-4335Conference Paper

Formation pathway of various oxygenated compounds for the homogeneous oxidation of isopentane in the vapor phaseNAGATA, Hideo; TASHIRO, Shizuka; KISHIDA, Masahiro et al.Sekiyu Gakkai Shi. 2001, Vol 44, Num 6, pp 392-396, issn 0582-4664Article

Optical anisotropy associated with the rotational alignment of complex-molecule vaporsTOLKACHEV, V. A.Optics and spectroscopy. 1991, Vol 71, Num 3, pp 269-272, issn 0030-400XArticle

Vapor-phase reduction of aldehydes and ketones with 2-propanol over hydrous zirconium oxideSHIBAGAKI, M; TAKAHASHI, K; KUNO, H et al.Chemistry Letters. 1988, Num 10, pp 1633-1636, issn 0366-7022Article

Befüllung von Anlagen mit Kältemittelgemischen aus der Dampfphase??? = Filling of installations with refrigerant fluids mixture out of vepn phaseREISS, M.Die Kälte und Klimatechnik. 1995, Vol 48, Num 9, pp 602-608, issn 0343-2246, 4 p.Article

Physical vapor deposition on cylindrical substratesHASS, D. D; MARCIANO, Y; WADLEY, H. N. G et al.Surface & coatings technology. 2004, Vol 185, Num 2-3, pp 283-291, issn 0257-8972, 9 p.Article

Dünne Hartstoffschichten prüfen = Inspection of ceramic coatingsVETTERS, H; HIRSCH, T; STOCK, H. R et al.Materialprüfung. 1993, Vol 35, Num 4, pp 90-97, issn 0025-5300Article

Introducing SECA: a new industry associationTEETER, Frederick J.Advanced materials & processes. 2001, Vol 159, Num 7, pp 28-30, issn 0882-7958Article

Application of a Hall accelerator to diamondlike carbon film coatingsOKADA, M; TOKU, H; YAMAMOTO, Y et al.Japanese journal of applied physics. 1992, Vol 31, Num 6A, pp 1845-1854, issn 0021-4922, 1Article

In-situ optical monitoring of the decomposition process of gaseous sources in metal-organic chemical vapor deposition and atomic layer epitaxyKOBAYASHI, N; KOBAYASHI, Y; YAMAUCHI, Y et al.Applied surface science. 1992, Vol 60-61, pp 544-552, issn 0169-4332Conference Paper

Real time in situ observation of (001) GaAs in OMCVD by reflectance difference spectroscopyKAMIYA, I; ASPNES, D. E; TANAKA, H et al.Applied surface science. 1992, Vol 60-61, pp 534-543, issn 0169-4332Conference Paper

Improvement of crystallinity of epitaxial Si_1-xGe_x films with SiH₄ treatment in in-situ rapid thermal chemical vapor depositionASHIKAGA, K; OHNO, M; NAKAMURA, T et al.Applied surface science. 1992, Vol 60-61, pp 597-601, issn 0169-4332Conference Paper

Growth and Characterization of GaN Nanowires by NiCl₂ Assisted Chemical Vapor DepositionXIAOFENG WEI; FENG SHI.Metallurgical and materials transactions. A, Physical metallurgy and materials science. 2011, Vol 42, Num 12, pp 3838-3843, issn 1073-5623, 6 p.Article

Free molecular transport and deposition in cylindrical featuresCALE, T. S; RAUPP, G. B.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1990, Vol 8, Num 4, pp 649-655, issn 0734-211X, 7 p.Article

Les dépôts céramiques = Ceramic depositionFAUCHAIS, P; DESMAISON, J; MACHET, J et al.L' Industrie céramique (Paris). 1987, Num 812, pp 48-56, issn 0019-9044Article

Evaporation à l'aide d'arcs électriques sous vide pour l'obtention de dépôt P.V.D = Evaporation with vacuum electric arc for PVD coatingsJACQUOT, P.Le Vide, les couches minces. 1986, Num 232, pp 35-37, issn 0223-4335Conference Paper

Measurement and correlation of viscosity of HFC227ea and HFC236fa in the vapor phaseXIAOPO WANG; WEI WANG; BO SONG et al.International journal of refrigeration. 2014, Vol 46, pp 152-157, issn 0140-7007, 6 p.Article