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Design of a manufacturable discrete track recording mediumWACHENSCHWANZ, David; WEN JIANG; RODDICK, Eric et al.IEEE transactions on magnetics. 2005, Vol 41, Num 2, pp 670-675, issn 0018-9464, 6 p.Conference Paper

Simple fabrication of nanostructure by continuous rigiflex imprintingSEO, Soon-Min; KIM, Tae-Il; LEE, Hong H et al.Microelectronic engineering. 2007, Vol 84, Num 4, pp 567-572, issn 0167-9317, 6 p.Article

Squeeze time investigations for step and flash imprint lithographyWUISTER, Sander F; LAMMERS, Jeroen H; KRUIJT-STEGEMAN, Yvonne W et al.Microelectronic engineering. 2009, Vol 86, Num 4-6, pp 681-683, issn 0167-9317, 3 p.Conference Paper

Fabrication of step and flash imprint lithography templates using a variable shaped-beam exposure toolDAUKSHER, William J; MANCINI, David; NORDQUIST, Kevin et al.Microelectronic engineering. 2004, Vol 75, Num 4, pp 345-351, issn 0167-9317, 7 p.Article

Fabrication of sub-micron 3-D structure using duo-mold UV-RIL processHAN, Kang-Soo; HONG, Sung-Hoon; JEONG, Jun-Ho et al.Microelectronic engineering. 2010, Vol 87, Num 4, pp 610-613, issn 0167-9317, 4 p.Article

Electrochemical Fabrication and Characterization of CoPt Bit Patterned Media: Towards a Wetchemical, Large-Scale FabricationOUCHI, Takanari; ARIKAWA, Yuki; KUNO, Taisuke et al.IEEE transactions on magnetics. 2010, Vol 46, Num 6, pp 2224-2227, issn 0018-9464, 4 p.Conference Paper

The fabrication of 3-D nanostructures by a low- voltage EBLSEUNG HUN OH; JAE GU KIM; CHANG SEOK KIM et al.Applied surface science. 2011, Vol 257, Num 9, pp 3817-3823, issn 0169-4332, 7 p.Article

A resist for electric imprint lithographyYONG SIK AHN; YONG CHEN; HAHN, H. Thomas et al.Microelectronic engineering. 2009, Vol 86, Num 3, pp 392-396, issn 0167-9317, 5 p.Article

Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writingTANABE, Yusuke; NISHIKAWA, Hiroyuki; SEKI, Yoshihiro et al.Microelectronic engineering. 2011, Vol 88, Num 8, pp 2145-2148, issn 0167-9317, 4 p.Conference Paper

Formation of aluminum tunnel pits arrayed using SU-8 masks with UV-assisted thermal imprint lithographyJANG, Joo-Hee; CHOI, Woo-Sung; KIM, Nam-Jeong et al.Microelectronic engineering. 2010, Vol 87, Num 12, pp 2610-2613, issn 0167-9317, 4 p.Article

Process control for 32 nm imprint masks using variable shape beam pattern generatorsTHOMPSON, Ecron; SELINIDIS, Kosta; MALTABES, John G et al.Microelectronic engineering. 2009, Vol 86, Num 4-6, pp 709-713, issn 0167-9317, 5 p.Conference Paper

Template fabrication for the 32 nm node and beyondSCHMID, Gerard M; THOMPSON, Ecron; STACEY, Nick et al.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 853-859, issn 0167-9317, 7 p.Conference Paper

Nanoimprint lithography for a large area pattern replicationLEBIB, A; CHEN, Y; BOURNEIX, J et al.Microelectronic engineering. 1999, Vol 46, Num 1-4, pp 319-322, issn 0167-9317Conference Paper

The use of nanoimprint lithography to improve efficiencies of bilayer organic solar cells based on P3HT and a small molecule acceptorWENJIN ZENG; KAREN SIEW LING CHONG; HONG YEE LOW et al.Thin solid films. 2009, Vol 517, Num 24, pp 6833-6836, issn 0040-6090, 4 p.Article

Selective dry etch process for step and flash imprint lithographyLE, Ngoc V; DAUKSHER, William J; GEHOSKI, Kathy A et al.Microelectronic engineering. 2005, Vol 78-79, pp 464-473, issn 0167-9317, 10 p.Conference Paper

Fine pattern fabrication on glass surface by imprint lithographyHIRAI, Y; KANAKUGI, K; YAMAGUCHI, T et al.Microelectronic engineering. 2003, Vol 67-68, pp 237-244, issn 0167-9317, 8 p.Conference Paper

Fabrication of complex 3D structures using Step and Flash Imprint Lithography (S-FIL)KETTLE, J; HOYLE, R. T; DIMOV, S et al.Microelectronic engineering. 2008, Vol 85, Num 5-6, pp 853-855, issn 0167-9317, 3 p.Conference Paper

Bioimprinting strategies: From soft lithography to biomimetic sensors and beyondMUJAHID, Adnan; IQBAL, Naseer; AFZAL, Adeel et al.Biotechnology advances. 2013, Vol 31, Num 8, pp 1435-1447, issn 0734-9750, 13 p.Article

Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithographyYANG, Ki-Yeon; KIM, Jong-Woo; BYEON, Kyeong-Jae et al.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 1552-1555, issn 0167-9317, 4 p.Conference Paper

Molded plastic micro-cavity lasersNILSSON, D; NIELSEN, T; KRISTENSEN, A et al.Microelectronic engineering. 2004, Vol 73-74, pp 372-376, issn 0167-9317, 5 p.Conference Paper

Enhanced light extraction from Y2O3: Eu3+ phosphor films via vacuum nano-imprint lithography using spin-on dielectric materialsKILBOCK LEE; KO, Ki-Young; JINHO AHN et al.Thin solid films. 2013, Vol 547, pp 222-224, issn 0040-6090, 3 p.Conference Paper

Anti-reflection and hydrophobic characteristics of M-PDMS based moth-eye nano-patterns on protection glass of photovoltaic systemsSHIN, Ju-Hyeon; HAN, Kang-Soo; LEE, Heon et al.Progress in photovoltaics (Print). 2011, Vol 19, Num 3, pp 339-344, issn 1062-7995, 6 p.Article

Improving the sensitivity and line edge roughness in inorganic positive electron beam resistOGINO, Kenta; TANIGUCHI, Jun; SATAKE, Shin-Ichi et al.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 1071-1074, issn 0167-9317, 4 p.Conference Paper

Nickel stamp fabrication using step & stamp imprint lithographyHAATAINEN, Tomi; MAJANDER, Päivi; RIEKKINEN, Tommi et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 948-950, issn 0167-9317, 3 p.Conference Paper

High performance direct methanol fuel cells with micro/nano-patterned polymer electrolyte membraneCHO, Yoon-Hwan; JIN WOO BAE; KIM, Ok-Hee et al.Journal of membrane science (Print). 2014, Vol 467, pp 36-40, issn 0376-7388, 5 p.Article

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