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AN AUTOMATED MASK INSPECTION SYSTEM. AMIS.BRUNING JH; FELDMAN M; KINSEL TS et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 487-495; BIBL. 15 REF.Article

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IMPLEMENTATION OF PHOTOMASKS FOR GUIDED WAVE OPTICAL COMPONENTS BY A STEP- AND -REPEAT PROCESSHOFFMANN D; LANGMANN U; OPPERMANN W et al.1981; FIBER INTEGR. OPT.; ISSN 0146-8030; USA; DA. 1981; VOL. 3; NO 4; PP. 401-411; BIBL. 5 REF.Article

IC PHOTOMASK BLANKS MEET STRINGENT REQUIREMENTSHARADA S; UCHIYA F.1979; J. ELECTRON. ENGNG; JPN; DA. 1979; NO 147; PP. 54-57Article

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CURRENT DEFINITIONS AND STANDARDS IN PHOTOMASK MANUFACTURING.KELLER CW.1978; INSULAT. CIRCUITS; U.S.A.; DA. 1978; VOL. 24; NO 5; PP. 33-35Article

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CERTAINES METHODES DE MULTIPLICATION DES DESSINS DE PHOTO-MASQUES REPRESENTANT LA TOPOLOGIE DES CIRCUITS INTEGRES REALISES A L'AIDE DES INSTALLATIONS A FAISCEAUX CATHODIQUESBEZNOSENKO DA; KISELEVSKIJ FN; MAN'KOVSKIJ VI et al.1974; IZVEST. VYSSH. UCHEBN. ZAVED., PRIBOROSTR.; S.S.S.R.; DA. 1974; VOL. 17; NO 9; PP. 110-112; BIBL. 2 REF.Article

THE SILICON REPEATERBOUWER AG; BOUWHUIS G; VAN HEEK HF et al.1977; PHILIPS TECH. REV.; NLD; DA. 1977; VOL. 37; NO 11-12; PP. 330-333; BIBL. DISSEM.Article

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