Secondary electron suppression in nitrogen plasma ion implantation using a low DC magnetic fieldUEDA, M; TAN, I. H; DALLAQUA, R. S et al.Surface & coatings technology. 2007, Vol 201, Num 15, pp 6597-6600, issn 0257-8972, 4 p.Conference Paper

Plasma immersion ion implantation in arc and glow discharge plasmas submitted to low magnetic fieldsTAN, I. H; UEDA, M; OLIVEIRA, R. M et al.Surface & coatings technology. 2007, Vol 201, Num 9-11, pp 4826-4831, issn 0257-8972, 6 p.Conference Paper