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Effects of mask misalignment and wafer misorientation on silicon V-groove etchingTAN, Songsheng; BOUDREAU, Robert; REED, Michael L et al.Sensors and materials. 2003, Vol 15, Num 2, pp 101-112, issn 0914-4935, 12 p.Article

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Economics of Automation for the Design-to-Mask InterfaceERCK, Wesley.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790U.1-73790U.10Conference Paper

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