Fabrication of high-aspect-ratio polymer nanochannels using a novel Si nanoimprint mold and solvent-assisted sealingCHO, Y. H; PARK, J; PARK, H et al.Microfluidics and nanofluidics (Print). 2010, Vol 9, Num 2-3, pp 163-170, issn 1613-4982, 8 p.Article

Integration of Servo and High Bit Aspect Ratio Data Patterns on Nanoimprint Templates for Patterned MediaLILLE, J; RUIZ, R; ALBRECHT, T. R et al.IEEE transactions on magnetics. 2012, Vol 48, Num 11, pp 2757-2760, issn 0018-9464, 4 p.Conference Paper

Nanomechanical Testing : Nanomechanical and nanotribological properties of polymeric ultrathin films for nanoimprint lithographyEKWINNSKA, M; LANDIS, S; EKWINSKI, G et al.Zeitschrift für Metallkunde. 2005, Vol 96, Num 11, pp 1287-1291, issn 0044-3093, 5 p.Conference Paper

Enhanced uniformity and durability of antisticlcing layer in imprinting stampsMOON JAE LEE; SANG UK CHO; SANG MAE LEE et al.Applied surface science. 2012, Vol 258, Num 17, pp 6545-6549, issn 0169-4332, 5 p.Article

UV-curable nanoimprint resin with enhanced anti-sticking propertyJOO YEON KIM; CHOI, Dae-Geun; JEONG, Jun-Ho et al.Applied surface science. 2008, Vol 254, Num 15, pp 4793-4796, issn 0169-4332, 4 p.Article

Transparent Cu nanowire mesh electrode on flexible substrates fabricated by transfer printing and its application in organic solar cellsKANG, Myung-Gyu; HUI JOON PARK; SE HYUN AHN et al.Solar energy materials and solar cells. 2010, Vol 94, Num 6, pp 1179-1184, issn 0927-0248, 6 p.Article

Fabrication of hydrophobic films replicated from plant leaves in natureLEE, Seung-Mo; HYUN SUP LEE; DONG SUNG KIM et al.Surface & coatings technology. 2006, Vol 201, Num 3-4, pp 553-559, issn 0257-8972, 7 p.Article

Advanced Lithography for Bit Patterned MediaXIAOMIN YANG; YUAN XU; LEE, Kim et al.IEEE transactions on magnetics. 2009, Vol 45, Num 2, pp 833-838, issn 0018-9464, 6 p., 2Conference Paper

Surface plasmon resonance as an innovative method for filling defects monitoring in nanoimprint lithographyHSU, Wei-Hsuan; HOCHENG, Hong; SHY, Jow-Tsong et al.Applied surface science. 2013, Vol 275, pp 94-101, issn 0169-4332, 8 p.Conference Paper

Fabrication of nanopatterned metal sheet using photolithography and electroplatingHWANG, Seon-Yong; PARK, Hyeong-Ho; KANG, Se-Min et al.Thin solid films. 2013, Vol 546, pp 132-135, issn 0040-6090, 4 p.Conference Paper

Polymers in conventional and alternative lithography for the fabrication of nanostructuresACIKGOZ, Canet; HEMPENIUS, Mark A; HUSKENS, Jurriaan et al.European polymer journal. 2011, Vol 47, Num 11, pp 2033-2052, issn 0014-3057, 20 p.Article

Realization of various sub-micron metal patterns using room temperature nanoimprint lithographySUNG, Jun-Ho; LEE, Min-Woo; LEE, Seung-Gol et al.Thin solid films. 2007, Vol 515, Num 12, pp 5153-5157, issn 0040-6090, 5 p.Conference Paper

Replication of rose petal surfaces using a nickel electroforming process and UV nanoimprint lithographyRYU, Sang-Woo; SOYOUNG CHOO; CHOI, Hak-Jong et al.Applied surface science. 2014, Vol 322, pp 57-63, issn 0169-4332, 7 p.Article

Replication of mold for UV-nanoimprint lithography using AAO membraneWEIMIN ZHOU; JING ZHANG; XIAOLI LI et al.Applied surface science. 2009, Vol 255, Num 18, pp 8019-8022, issn 0169-4332, 4 p.Article

Large-area fabrication of 3D petal-like nanopattern for surface enhanced Raman scatteringWEIMIN ZHOU; JINHE WANG; JING ZHANG et al.Applied surface science. 2014, Vol 303, pp 84-89, issn 0169-4332, 6 p.Article

Influence of mold and substrate material combinations on nanoimprint lithography process: MD simulation approachSEUNGHWA YANG; SUYOUNG YU; MAENGHYO CHO et al.Applied surface science. 2014, Vol 301, pp 189-198, issn 0169-4332, 10 p.Article

Direct pattern transfer for sub-45 nm features using nanoimprint lithographyLE, Ngoc V; DAUKSHER, William J; GEHOSKI, Kathy A et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 839-842, issn 0167-9317, 4 p.Conference Paper

Fabrication of size-tunable antireflective nanopillar array using hybrid nano-patterning lithographyWU, Hung-Chun; XUEBO XU; MEIYING HE et al.Surface & coatings technology. 2014, Vol 240, pp 413-418, issn 0257-8972, 6 p.Article

Fabrication of multi-dimensional colloid crystals on raised surfaces via reversal nanoimprint lithographyWEI ZHAO; YUEBING ZHENG; HONG YEE LOW et al.Microelectronic engineering. 2006, Vol 83, Num 3, pp 404-408, issn 0167-9317, 5 p.Article

Air cushion press for excellent uniformity, high yield, and fast nanoimprint across a 100 mm fieldHE GAO; HUA TAN; WEI ZHANG et al.Nano letters (Print). 2006, Vol 6, Num 11, pp 2438-2441, issn 1530-6984, 4 p.Article

Robust Pattern Transfer of Nanoimprinted Features for Sub-5-nm FabricationSCHVARTZMAN, Mark; WIND, Shalom J.Nano letters (Print). 2009, Vol 9, Num 10, pp 3629-3634, issn 1530-6984, 6 p.Article

The influence of stamp deformation on residual layer homogeneity in thermal nanoimprint lithographyMERINO, S; RETOLAZA, A; JUARROS, A et al.Microelectronic engineering. 2008, Vol 85, Num 9, pp 1892-1896, issn 0167-9317, 5 p.Article

Sub-10 nm Nanoimprint Lithography by Wafer BowingWEI WU; TONG, William M; WANG, Shih-Yuan et al.Nano letters (Print). 2008, Vol 8, Num 11, pp 3865-3869, issn 1530-6984, 5 p.Article

The use of automatic demolding in nanoimprint lithography processesMERINO, S; SCHIFT, H; RETOLAZA, A et al.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 958-962, issn 0167-9317, 5 p.Conference Paper

Anti-adhesion treatment for nanoimprint stamps using atmospheric pressure plasma CVD (APPCVD)WU, Chien-Li; YANG, Cho-Yun; AN, Tai-Pang et al.Applied surface science. 2012, Vol 261, pp 441-446, issn 0169-4332, 6 p.Article