kw.\*:("PHOTOGRAPHIC MASK")
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IC PHOTOMASK BLANKS MEET STRINGENT REQUIREMENTSHARADA S; UCHIYA F.1979; J. ELECTRON. ENGNG; JPN; DA. 1979; NO 147; PP. 54-57Article
CURRENT DEFINITIONS AND STANDARDS IN PHOTOMASK MANUFACTURING.KELLER CW.1978; INSULAT. CIRCUITS; U.S.A.; DA. 1978; VOL. 24; NO 5; PP. 33-35Article
MISE EN OEUVRE DU PHOTOREPETEUR MONO-OBJECTIF UNIVERSEL UER DANS L'INDUSTRIE DES SEMI-CONDUCTEURSHOESSEL B.1978; REV. IENA; DDR; DA. 1978; VOL. 18; NO 5; PP. 219-221; BIBL. 2 REF.Article
A SIMPLE MASK ALIGNER AND PRINTING FRAME FOR CONFORMABLE PHOTOMASK LITHOGRAPHYSMILOWITZ B; LANG RJ.1980; IEEE TRANS. ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 11; PP. 2165-2167; BIBL. 3 REF.Article
PHOTOMASK MANUFACTURING. REQUIREMENTS, CAPABILITIES AND TRENDSJACOBSON DS.1979; CIRCUITS MANUF.; USA; DA. 1979; VOL. 19; NO 10; PP. 46-58; (6 P.); BIBL. 1 REF.Article
THEORY AND PRACTICE OF IMAGE FORMATION BY THE PHOTOPROJECTION METHOD OF SUBMICRON PATTERNS.VAN DEN BERG HAM; RUIGROK JJM.1978; APPL. PHYS.; GERM.; DA. 1978; VOL. 16; NO 3; PP. 279-287; BIBL. 19 REF.Article
AN ECONOMIC PHOTOMASK PROCESSING SCHEME FOR THE SMALL LABORATORY.JAGGERS KA.1978; INTERNATION. J. ELECTR. ENGNG EDUC.; G.B.; DA. 1978; VOL. 15; NO 1; PP. 41-52; ABS. FR. ALLEM. ESP.; BIBL. 4 REF.Article
UNTERSUCHUNG DER DECKUNGSGENAUIGKEIT ZWEIER AUFEINANDERFOLGENDER FOTOSCHABLONENAUF TESTSCH EIBEN = ETUDE DE LA PRECISION DE RECOUVREMENT DE DEUX MASQUES PHOTOGRAPHIQUES SUCCESSIFS SUR UNE LAME D'ESSAIPAUER M; HUSZKA Z; PUSKAS L et al.1979; NACHR.-TECH., ELEKTRON.; DDR; DA. 1979; VOL. 29; NO 5; PP. 214-217Article
AUTOMATED PHOTOMASK INSPECTION.NOVOTNY DB; CIARLO DR.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 51-76 (10P.); BIBL. 32 REF.Article
THE SILICON REPEATERBOUWER AG; BOUWHUIS G; VAN HEEK HF et al.1977; PHILIPS TECH. REV.; NLD; DA. 1977; VOL. 37; NO 11-12; PP. 330-333; BIBL. DISSEM.Article
GALVANOMETER DEFLECTION: A PRECISION HIGH-SPEED SYSTEM.JABLONOWSKI DP; RAAMOT J.1976; APPL. OPT.; U.S.A.; DA. 1976; VOL. 15; NO 6; PP. 1437-1443; BIBL. 5 REF.Article
OVERVIEW OF PHOTOMASK SUBSTRATE FLATNESS MEASUREMENT TECHNIQUES.LEINEN RF II.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 77-81Article
IMPROVED TECHNIQUES FOR PROXIMITY MASK ALIGNMENT.CLARK KG; OKUTSU K.1976; SOLID STATE TECHNOL.; U.S.A.; DA. 1976; VOL. 19; NO 4; PP. 79-84; BIBL. 10 REF.Article
COMPUTER-AIDED CCD/LSI PHOTOMASK LAYOUT AND DOCUMENTATION TECHNIQUE USING NESTED CELLSGEER RG.1980; SOLID STATE TECHNOL.; USA; DA. 1980; VOL. 23; NO 5; PP. 86-90; BIBL. 2 REF.Article
ONE-STEP REPAIR OF TRANSPARENT DEFECTS IN HARD-SURFACE PHOTOLITHOGRAPHIC MASKS VIA LASER PHOTODEPOSITIONEHRLICH DJ; OSGOOD RM JR; SILVERSMITH DJ et al.1980; IEEE ELECTRON DEVICE LETT.; USA; DA. 1980; VOL. 1; NO 6; PP. 101-103; BIBL. 5 REF.Article
A PRODUCTION-COMPATIBLE MICROELECTRONIC TEST PATTERN FOR EVALUATING PHOTOMASK MISALIGNMENTRUSSELL TJ; MAXWELL DA.1979; NATION. BUR. STAND., SPEC. PUBL.; USA; DA. 1979; NO 400-51; 31 P.; BIBL. DISSEM.Serial Issue
AUTOMATED EQUIPMENT FOR 100% INSPECTION OF PHOTOMASKS.LEVY K.1978; SOLIDE STATE TECHNOL.; USA; DA. 1978; VOL. 21; NO 5; PP. 60-71 (8P.); BIBL. 5 REF.Article
AUTOMATIC ALIGNMENT CONSIDERATIONS IN WAFER FABRICATION.DENNING PA.1976; SOLID STATE TECHNOL.; U.S.A.; DA. 1976; VOL. 19; NO 5; PP. 43-47; BIBL. 3 REF.Article
AUTOMATIC PHOTOMASK INSPECTION BECOMES A REALITYUCHIYAMA Y.1980; J. ELECTRON. ENGNG; JPN; DA. 1980; VOL. 17; NO 159; PP. 42-44; BIBL. 6 REF.Article
PHOTOMASK LINEWIDTH MEASUREMENTSWYT SA; ROSBERRY FW; NYYSSONEN D et al.1978; CIRCUITS MANUF.; USA; DA. 1978; VOL. 18; NO 9; PP. 20-26; (4 P.)Article
IMPROVED TECHNIQUES FOR PROXIMITY MASK ALIGNMENT.CLARK KG; OKUTSU K.1975; MICROELECTRONICS; G.B.; DA. 1975; VOL. 6; NO 4; PP. 51-59; BIBL. 10 REF.Article
TECHNOLOGICAL IMPLICATIONS IN THE PHOTOMASKING PROCESS.O'MALLEY AJ.1975; SOLID STATE TECHNOL.; U.S.A.; DA. 1975; VOL. 18; NO 6; PP. 40-45Article
CLEANING PHOTOMASKS WITH SCRUBBERS AND HIGH-PRESSURE WATER.1978; CIRCUITS MANUF.; USA; DA. 1978-06; PP. 16-21; (3 P.); BIBL. 4 REF.Article
A VERSATILE, EASILY ASSIMILATED MICROCOMPUTER FOR INSTRUMENTATION DEVELOPMENT APPLIED TO DIRECT PHOTOGRAPHIC MASK GENERATION.SCHMALZEL JL; D'LUNA LJ; LUCAS MSP et al.1977; I.E.E.E. TRANS. INDUSTR. ELECTRON. CONTROL INSTRUMENT.; U.S.A.; DA. 1977; VOL. 24; NO 3; PP. 248-252; BIBL. 2 REF.Article
NEW PHOTOGRAPHIC MATERIAL FOR MICROELECTRONICS.SIMEONOV V; MEDNIKAROV B; MALINOWSKI J et al.1973; GOD. SOFIJSK. UNIV., KHIM. FAK.; BALG.; DA. 1973-1974 PARU 1977; VOL. 68; PP. 47-51; ABS. RUSSE; BIBL. 5 REF.Article