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LOIS DE VARIATION EN FONCTION DE LA TEMPERATURE DE LA COMPOSANTE IONIQUE DE LA PULVERISATION CATHODIQUE DES METAUX REFRACTAIRES DANS UNE ATMOSPHERE D'OXYGENEADYLOV AA; VEKSLER VI; REZNIK AM et al.1975; IZVEST. AKAD. NAUK NZ. S.S.R., FIZ.-MAT. NAUK; S.S.S.R.; DA. 1975; VOL. 19; NO 2; PP. 81-83; BIBL. 5 REF.Article

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BREVET 2.324.755 (A1) (75 28778). - 19 SEPTEMBRE 1975. DISPOSITIF DE PULVERISATION CATHODIQUE DE GRANDE VITESSE DE DEPOT.sdPatent