A study on the reactive sputtering process with plasma chemistryCHUAN LI; HSIEH, J. H; HUANG, W. M et al.Surface & coatings technology. 2005, Vol 198, Num 1-3, pp 372-378, issn 0257-8972, 7 p.Conference Paper

A study of the process pressure influence in reactive sputtering aiming at hysteresis eliminationSÄRHAMMAR, E; STRIJCKMANS, K; NYBERG, T et al.Surface & coatings technology. 2013, Vol 232, pp 357-361, issn 0257-8972, 5 p.Article

Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targetsKUBART, Iomáš; CADA, Martin; LUNDIN, Daniel et al.Surface & coatings technology. 2014, Vol 238, pp 152-157, issn 0257-8972, 6 p.Article

The role of the erosion groove during reactive sputter depositionDEPLA, D; STRIJCKMANS, K; DE GRYSE, R et al.Surface & coatings technology. 2014, Vol 258, pp 1011-1015, issn 0257-8972, 5 p.Article

Upgrading the Berg-model for reactive sputtering processesBERG, S; SÄRHAMMAR, E; NYBERG, T et al.Thin solid films. 2014, Vol 565, pp 186-192, issn 0040-6090, 7 p.Article

Studies of hysteresis effect in reactive HiPIMS deposition of oxidesKUBART, T; AIEMPANAKIT, M; ANDERSSON, J et al.Surface & coatings technology. 2011, Vol 205, issn 0257-8972, S303-S306, SUP2Conference Paper

Reactive sputtering of TiO_xN_y coatings by the reactive gas pulsing process. Part II: The role of the duty cycleMARTIN, N; LINTYMER, J; GAVOILLE, J et al.Surface & coatings technology. 2007, Vol 201, Num 18, pp 7727-7732, issn 0257-8972, 6 p.Article

Reactive sputtering of TiO_xN_y coatings by the reactive gas pulsing process. Part I: Pattern and period of pulsesMARTIN, N; LINTYMER, J; GAVOILLE, J et al.Surface & coatings technology. 2007, Vol 201, Num 18, pp 7720-7726, issn 0257-8972, 7 p.Article

Influence of reactive gas and temperature on structural properties of magnetron sputtered CrSiN coatingsSHAH, Hetal N; JAYAGANTHAN, R; KAUR, Davinder et al.Applied surface science. 2011, Vol 257, Num 13, pp 5535-5543, issn 0169-4332, 9 p.Article

Gas aggregation nanocluster source — Reactive sputter deposition of copper and titanium nanoclustersMAREK, Ales; VALTER, Jan; KADLEC, Stanislav et al.Surface & coatings technology. 2011, Vol 205, issn 0257-8972, S573-S576, SUP2Conference Paper

Period dependence of hardness and microstructure on nanometric Cr/CrN multilayersROMERO, J; ESTEVE, J; LOUSA, A et al.Surface & coatings technology. 2004, Vol 188-89, pp 338-343, issn 0257-8972, 6 p.Conference Paper

Modeling reactive magnetron sputtering: Fixing the parameter setSTRIJCKMANS, K; LEROY, W. P; DE GRYSE, R et al.Surface & coatings technology. 2012, Vol 206, Num 17, pp 3666-3675, issn 0257-8972, 10 p.Article

Effect of the deposition process on the composition and structure of sputtered lanthanum cuprate filmsTRANVOUEZ, N; PIERSON, J. F; CAPON, F et al.Surface & coatings technology. 2011, Vol 205, issn 0257-8972, S254-S257, SUP2Conference Paper

Process structure properties relationship during formation of CrN and AlN layers on H13 SteelROJO, A; OSEGUERA, J; SALAS, O et al.Surface & coatings technology. 2008, Vol 203, Num 3-4, pp 217-222, issn 0257-8972, 6 p.Article

Influencing the hysteresis during reactive magnetron sputtering by gas separationDEPLA, D; HAEMERS, J; DE GRYSE, R et al.Surface & coatings technology. 2013, Vol 235, pp 62-67, issn 0257-8972, 6 p.Article

Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O₂ atmosphereCADA, Martin; HUBICKA, Zdenek; ADAMEK, Petr et al.Surface & coatings technology. 2011, Vol 205, issn 0257-8972, S317-S321, SUP2Conference Paper

Reactive sputtering of TiO_xN_y coatings by the reactive gas pulsing process: Part III: The particular case of exponential pulsesMARTIN, N; LINTYMER, J; GAVOILLE, J et al.Surface & coatings technology. 2007, Vol 201, Num 18, pp 7733-7738, issn 0257-8972, 6 p.Article

Simulation of TaN_x deposition by Reactive PVDWOLF, H; STREITER, R; FRIEDEMANN, M et al.Microelectronic engineering. 2010, Vol 87, Num 10, pp 1907-1913, issn 0167-9317, 7 p.Article

Influence of air oxidation on the properties of decorative NbO_xN_y coatings prepared by reactive gas pulsingCHAPPE, J. M; CARVALHO, P; ALVES, E et al.Surface & coatings technology. 2008, Vol 202, Num 11, pp 2363-2367, issn 0257-8972, 5 p.Conference Paper

Influence of substrate temperature on structure and mechanical, properties of multi-element (AlCrTaTiZr)N coatingsLAI, Chia-Han; TSAI, Ming-Hung; LIN, Su-Jien et al.Surface & coatings technology. 2007, Vol 201, Num 16-17, pp 6993-6998, issn 0257-8972, 6 p.Article

Influence of the current applied to the silver target on the structure and the properties of Ag-Cu-O films deposited by reactive cosputteringPIERSON, J. F; HORWAT, D.Applied surface science. 2007, Vol 253, Num 18, pp 7522-7526, issn 0169-4332, 5 p.Article

Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayersCACUCCI, Arnaud; LOFFREDO, Stéphane; POTIN, Valérie et al.Surface & coatings technology. 2013, Vol 227, pp 38-41, issn 0257-8972, 4 p.Conference Paper

Effect of Na diffusion from glass substrate on the microstructural and photocatalytic properties of post-annealed TiO₂ films synthesised by reactive sputteringAUBRY, E; LAMBERT, J; DEMANGE, V et al.Surface & coatings technology. 2012, Vol 206, Num 23, pp 4999-5005, issn 0257-8972, 7 p.Article

Two-phase single layer Al-O-N nanocomposite films with enhanced resistance to crackingMUSIL, J; JILEK, R; MEISSNER, M et al.Surface & coatings technology. 2012, Vol 206, Num 19-20, pp 4230-4234, issn 0257-8972, 5 p.Article

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxideAIEMPANAKIT, Montri; HELMERSSON, Ulf; AIJAZ, Asim et al.Surface & coatings technology. 2011, Vol 205, Num 20, pp 4828-4831, issn 0257-8972, 4 p.Article