The far-ultraviolet continuum of quasars and the universe at Z>4NETZER, H.The Astrophysical journal. 1985, Vol 289, Num 2, pp 451-456, issn 0004-637XArticle

Determination of complex index of immersion liquids at 193nmSTEHLE, Jean-Louis; PIEL, Jean-Philippe; CAMPILLO-CARRETO, Jose et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 3, 61544G.1-61544G.7Conference Paper

Can DUV take us below 100 nm?FINDERS, Jo; JORRITSMA, Louis; EURLINGS, Mark et al.SPIE proceedings series. 2001, pp 153-165, isbn 0-8194-4032-9, 2VolConference Paper

Increased yield and tool life by reduction of DUV Photo contamination using Parts per trillion pure purge gasesLANDONI, Cristian; SUCCI, Marco; RABELLINO, Larry et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6195-4, 2Vol, vol 2, 61523K.1-61523K.10Conference Paper

Simultaneous scanning of the revolver undulator and monochromator at BL-19A of the photon factoryKAKIZAKI, A; OHKUMA, H; KINOSHITA, T et al.Review of scientific instruments. 1992, Vol 63, Num 1, pp 367-370, issn 0034-6748, 2AConference Paper

On the problem of extreme UV and X-ray lasersSOBEL'MAN, I. I; VINOGRADOV, A. V.Advances in atomic and molecular physics. 1985, Vol 20, pp 327-345, issn 0065-2199Article

Excimer ions as possible candidates for VUV and XUV lasersSAUERBREY, R; LANGHOFF, H.IEEE journal of quantum electronics. 1985, Vol 21, Num 3, pp 179-181, issn 0018-9197Article

A practical solution to the critical problem of 193 nm reticle hazeHALBMAIER, Dave; OHYASHIKI, Yasushi; KISHKOVICH, Oleg et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282G.1-70282G.7, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

A short period undulator for MAXAHOLA, H; MEINANDER, T.Review of scientific instruments. 1992, Vol 63, Num 1, pp 372-375, issn 0034-6748, 2AConference Paper

Approach for VUV positive resists using photodecomposable polymersKISHIMURA, Shinji; KATSUYAMA, Akiko; SASAGO, Masaru et al.SPIE proceedings series. 2000, pp 347-356, isbn 0-8194-3617-8Conference Paper

Lithography Cost of OwnershipSEIDEL, Phil.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 585-641, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 57 p.Book Chapter

Variability in the vacuum-ultraviolet transmittance of magnesium fluoride windowsHERZIG, H; FLEETWOOD, C. M; TOFT, A. R et al.Applied optics. 1992, Vol 31, Num 1, pp 110-114, issn 0003-6935Article

Extreme-ultraviolet optical constant determination near an absorption edgeSULLIVAN, B. T; MONTCALM, C.Applied optics. 1991, Vol 30, Num 28, pp 4010-4011, issn 0003-6935Article

Ultranarrow bandwith VUV-XUV laser systemCROMWELL, E; TRICKL, T; LEE, Y. T et al.Review of scientific instruments. 1989, Vol 60, Num 9, pp 2888-2892, issn 0034-6748Article

Investigation of a laser-produced plasma VUV light sourceBRIDGES, J. M; CROMER, C. L; MCILRATH, T. J et al.Applied optics. 1986, Vol 25, Num 13, pp 2208-2214, issn 0003-6935Article

Photoionisation processes in the 5d, 6s and 6p shells of atomic lead and the 4d shell of atomic tinDERENBACH, H; KOSSMANN, H; MALUTZKI, R et al.Journal of physics. B. Atomic and molecular physics. 1985, Vol 18, Num 7, issn 0022-3700, L189Article

Etude des transitions utilisables pour les lasers UV sous vide à vapeurs de potassiumKUPLYAUSKENE, A. V; KUPLYAUSKIS, Z. J.Optika i spektroskopiâ. 1985, Vol 58, Num 6, pp 1341-1344, issn 0030-4034Article

Surface discharges as intense photon sources in the extreme ultravioletWOODWORTH, J. R; MCKAY, P. F.Journal of applied physics. 1985, Vol 58, Num 9, pp 3364-3367, issn 0021-8979Article

Interpretation of the satellite spectrum that follows ionization in the 5s and 5p shells of Xe at low photon energyHANSEN, J. E; PERSSON, W.Physical review. A, General physics. 1984, Vol 30, Num 3, pp 1565-1567, issn 0556-2791Article

Characterization of low-order aberrations in the SEMATECH Albany MET toolNAULLEAU, Patrick; WATERMAN, Justin; DEAN, Kim et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65172Q.1-65172Q.9, issn 0277-786X, isbn 978-0-8194-6636-5Conference Paper

Single-step lift-off process using chlorobenzene soak on AZ4000 resistsFATHIMULLA, A.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1985, Vol 3, Num 1, pp 25-27, issn 0734-211XArticle

Observations of the high latitude far ultraviolet background in the 1040-1080 Å bandBIXLER, J; BOWYER, S; GREWING, M et al.Astronomy and astrophysics (Berlin. Print). 1984, Vol 141, Num 2, pp 422-424, issn 0004-6361Article

Environmental data from the Engineering Test StandKLEBANOFF, L. E; GRUNOW, P. A; GRAHAM, S et al.SPIE proceedings series. 2002, pp 310-315, isbn 0-8194-4434-0, 2VolConference Paper

The MEEF shall inherit the earthCONLEY, Will; GARZA, Cesar; DUSA, Mircea et al.SPIE proceedings series. 2001, pp 251-258, isbn 0-8194-4032-9, 2VolConference Paper

Transient decreases of Earth's far-ultraviolet dayglowFRANK, L. A; SIGWARTH, J. B.Geophysical research letters. 1997, Vol 24, Num 19, pp 2423-2426, issn 0094-8276Article