kw.\*:("silicon carbide (SiC)")
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1580-V-40-mΩ · cm2 Double-RESURF MOSFETs on 4H-SiC (0001)NOBORIO, Masato; SUDA, Jun; KIMOTO, Tsunenobu et al.IEEE electron device letters. 2009, Vol 30, Num 8, pp 831-833, issn 0741-3106, 3 p.Article
Heat Testing of a Prototypical SiC-Foam-Based Flow Channel InsertSHARAFAT, S; AOYAMA, A; GHONIEM, N et al.IEEE transactions on plasma science. 2010, Vol 38, Num 10, pp 2993-2998, issn 0093-3813, 6 p., 2Article
Intercalation of H at the graphene/SiC(0001) interface: Structure and stability from first principlesSCLAUZERO, Gabriele; PASQUARELLO, Alfredo.Applied surface science. 2014, Vol 291, pp 64-68, issn 0169-4332, 5 p.Conference Paper
Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurryYAN ZHOU; GUOSHUN PAN; XIAOLEI SHI et al.Surface & coatings technology. 2014, Vol 251, pp 48-55, issn 0257-8972, 8 p.Article
Silicon carbide whiskers with superlattice structure : A precursor for a new type of nanoreactorLUTSENKO, Vadym G.Acta materialia. 2008, Vol 56, Num 11, pp 2450-2455, issn 1359-6454, 6 p.Article
Core-shell structure from the solution-reprecipitation process in hot-pressed A1N-doped SiC ceramicsJIANFENG HU; HUI GU; ZHONGMING CHEN et al.Acta materialia. 2007, Vol 55, Num 16, pp 5666-5673, issn 1359-6454, 8 p.Article
Structure of the SiC (0 0 01) 3 × 3 reconstruction studied by surface X-ray diffractionVOEGELI, W; AKIMOTO, K; SUGIYAMA, H et al.Applied surface science. 2006, Vol 252, Num 15, pp 5259-5262, issn 0169-4332, 4 p.Conference Paper
Carbon-Doped Polysilicon Floating Gate for Improved Data Retention and P/E Window of Flash MemoryJING PU; KIM, Sun-Jung; LEE, Seung-Hwan et al.IEEE electron device letters. 2008, Vol 29, Num 7, pp 688-690, issn 0741-3106, 3 p.Article
Photoluminescence and electroluminescence imaging of carrot defect in 4H-SiC epitaxyLIU, Kendrick X; STAHLBUSH, Robert E; TWIGG, Mark E et al.Journal of electronic materials. 2007, Vol 36, Num 4, pp 297-306, issn 0361-5235, 10 p.Article
Electrothermally Actuated Silicon Carbide Tunable MEMS ResonatorsMASTROPAOLO, Enrico; WOOD, Graham S; GUAL, Isaac et al.Journal of microelectromechanical systems. 2012, Vol 21, Num 4, pp 811-821, issn 1057-7157, 11 p.Article
Improvement of Current Gain in 4H-SiC BJTs by Surface Passivation With Deposited Oxides Nitrided in N2O or NOMIYAKE, Hiroki; KIMOTO, Tsunenobu; SUDA, Jun et al.IEEE electron device letters. 2011, Vol 32, Num 3, pp 285-287, issn 0741-3106, 3 p.Article
Analysis of Anomalous Charge-Pumping Characteristics on 4H-SiC MOSFETs : Silicon carbide devices and technologyOKAMOTO, Dai; YANO, Hiroshi; HATAYAMA, Tomoaki et al.I.E.E.E. transactions on electron devices. 2008, Vol 55, Num 8, pp 2013-2020, issn 0018-9383, 8 p.Article
Monte Carlo Simulation of Ion Implantation in Crystalline SiC With Arbitrary Polytypes : Silicon carbide devices and technologySHIYANG TIAN.I.E.E.E. transactions on electron devices. 2008, Vol 55, Num 8, pp 1991-1996, issn 0018-9383, 6 p.Article
Ultralow Voltage Operation of Al/LaxCe1―xOz/4H-SiC for Oxygen SensingWAY FOONG LIM; KUAN YEW CHEONG.IEEE electron device letters. 2013, Vol 34, Num 11, pp 1430-1432, issn 0741-3106, 3 p.Article
Demonstration of Common-Emitter Operation in AlGaN/SiC Heterojunction Bipolar TransistorsMIYAKE, Hiroki; KIMOTO, Tsunenobu; SUDA, Jun et al.IEEE electron device letters. 2010, Vol 31, Num 9, pp 942-944, issn 0741-3106, 3 p.Article
High-Voltage n-Channel IGBTs on Free-Standing 4H-SiC EpilayersXIAOKUN WANG; COOPER, James A.I.E.E.E. transactions on electron devices. 2010, Vol 57, Num 2, pp 511-515, issn 0018-9383, 5 p.Article
Time Dependence of Bias-Stress-Induced SiC MOSFET Threshold-Voltage Instability Measurements : Silicon carbide devices and technologyLELIS, Aivars J; HABERSAT, Daniel; GREEN, Ronald et al.I.E.E.E. transactions on electron devices. 2008, Vol 55, Num 8, pp 1835-1840, issn 0018-9383, 6 p.Article
800 V 4H-SiC RESURF-type lateral JFETsFUJIKAWA, Kazuhiro; SHIBATA, Kaoru; MASUDA, Takeyoshi et al.IEEE electron device letters. 2004, Vol 25, Num 12, pp 790-791, issn 0741-3106, 2 p.Article
Limitations of the High―Low C―V Technique for MOS Interfaces With Large Time Constant DispersionPENUMATCHA, Ashish Verma; SWANDONO, Steven; COOPER, James A et al.I.E.E.E. transactions on electron devices. 2013, Vol 60, Num 3, pp 923-926, issn 0018-9383, 4 p.Article
Effects of Nitridation on 4H-SiC MOSFETs Fabricated on Various Crystal FacesNANEN, Yuichiro; KATO, Muneharu; JUN SUDA et al.I.E.E.E. transactions on electron devices. 2013, Vol 60, Num 3, pp 1260-1262, issn 0018-9383, 3 p.Article
High Detection Sensitivity of Ultraviolet 4H-SiC Avalanche PhotodiodesXIAOGANG BAI; XIANGYI GUO; MCINTOSH, Dion C et al.IEEE journal of quantum electronics. 2007, Vol 43, Num 11-12, pp 1159-1162, issn 0018-9197, 4 p.Article
Threading Screw Dislocations in 4H-SiC Wafer Observed by the Weak-Beam Method in Bragg-Case X-ray TopographyYAMAGUCHI, Hirotaka; MATSUHATA, Hirofumi.Journal of electronic materials. 2010, Vol 39, Num 6, pp 715-718, issn 0361-5235, 4 p.Conference Paper
P-Channel MOSFETs on 4H-SiC {0001} and Nonbasal Faces Fabricated by Oxide Deposition and N20 AnnealingNOBORIO, Masato; SUDA, Jun; KIMOTO, Tsunenobu et al.I.E.E.E. transactions on electron devices. 2009, Vol 56, Num 9, pp 1953-1958, issn 0018-9383, 6 p.Article
430-V 12.4-mΩ · cm2 normally OFF 4H-SiC lateral JFETMING SU; KUANG SHENG; YUZHU LI et al.IEEE electron device letters. 2006, Vol 27, Num 10, pp 834-836, issn 0741-3106, 3 p.Article
Experimental and theoretical investigations on short-channel effects in 4H-SiC MOSFETsNOBORIO, Masato; KANZAKI, Yosuke; SUDA, Jun et al.I.E.E.E. transactions on electron devices. 2005, Vol 52, Num 9, pp 1954-1962, issn 0018-9383, 9 p.Article