22nd Symposium on Plasma Science for Materials (SPSM)TERASHIMA, K; ICHIKI, T; WATANABE, T et al.Thin solid films. 2010, Vol 518, Num 13, issn 0040-6090, 154 p.Conference Proceedings

Microplasma array with metamaterial effectsSAKAI, Osamu; NAITO, Teruki; SHIMOMURA, Takuya et al.Thin solid films. 2010, Vol 518, Num 13, pp 3444-3448, issn 0040-6090, 5 p.Conference Paper

Fabrication of discrete array of metallodielectric nanoshells and their surface plasmonic propertiesUCHIDA, Shuhei; YAMAMURA, Kazuya; ZETTSU, Nobuyuki et al.Thin solid films. 2010, Vol 518, Num 13, pp 3581-3584, issn 0040-6090, 4 p.Conference Paper

Chemical diagnosis of DLC by ESR spectral analysisYAMAUCHI, Yukinori; SASAI, Yasushi; KONDO, Shin-Ichi et al.Thin solid films. 2010, Vol 518, Num 13, pp 3492-3496, issn 0040-6090, 5 p.Conference Paper

Deposition of amorphous carbon nitride films using Ar/N₂ supermagnetron sputterKINOSHITA, Haruhisa; KUBOTA, Masaya; OHNO, Genji et al.Thin solid films. 2010, Vol 518, Num 13, pp 3502-3505, issn 0040-6090, 4 p.Conference Paper

Bias frequency dependence of pn junction charging damage induced by plasma processingKAMEI, Masayuki; NAKAKUBO, Yoshinori; ERIGUCHI, Koji et al.Thin solid films. 2010, Vol 518, Num 13, pp 3469-3474, issn 0040-6090, 6 p.Conference Paper

Difference of deposition process of an amorphous carbon film due to source gasesSHINOHARA, Masanori; KAWAZOE, Hiroki; INAYOSHI, Takanori et al.Thin solid films. 2010, Vol 518, Num 13, pp 3497-3501, issn 0040-6090, 5 p.Conference Paper

Modeling of ion-bombardment damage on Si surfaces for in-line analysisMATSUDA, Asahiko; NAKAKUBO, Yoshinori; TAKAO, Yoshinori et al.Thin solid films. 2010, Vol 518, Num 13, pp 3481-3486, issn 0040-6090, 6 p.Conference Paper

Non-equilibrium plasma property of ArGTA in low current rangeTASHIRO, Shinichi; TANAKA, Manabu.Thin solid films. 2010, Vol 518, Num 13, pp 3453-3456, issn 0040-6090, 4 p.Conference Paper

Formation of ZnO nanostructures in energy-controlled hollow-type magnetron RF plasmaKUMETA, Keisuke; ONO, Hideki; IIZUKA, Satoru et al.Thin solid films. 2010, Vol 518, Num 13, pp 3522-3525, issn 0040-6090, 4 p.Conference Paper

Production of ultrafine atmospheric pressure plasma jet with nano-capillaryKAKEI, Ryota; OGINO, Akihisa; IWATA, Futoshi et al.Thin solid films. 2010, Vol 518, Num 13, pp 3457-3460, issn 0040-6090, 4 p.Conference Paper

Modification of peptide by surface-wave plasma processingMOTRESCU, Iuliana; OGINO, Akihisa; TANAKA, Shigeyasu et al.Thin solid films. 2010, Vol 518, Num 13, pp 3585-3589, issn 0040-6090, 5 p.Conference Paper

Growth of well-aligned carbon nanotubes by RF-DC plasma chemical vapor depositionHAYASHI, Yasuaki; FUKUMURA, Takuya; ODANI, Kazunori et al.Thin solid films. 2010, Vol 518, Num 13, pp 3506-3508, issn 0040-6090, 3 p.Conference Paper

Cathodoluminescence property of ZnO nano-phosphors fabricated by pulsed Nd:YAG laser ablation in plasma circumstanceQIANG MA; OGINO, Akihisa; MATSUDA, Takafumi et al.Thin solid films. 2010, Vol 518, Num 13, pp 3517-3521, issn 0040-6090, 5 p.Conference Paper

The deposition mechanism of atmospheric pressure glow plasma polymerized hexafluoropropene: Gas phase analysis of HFP plasmaOZAKI, Ren; KOGOMA, Masuhiro; TANAKA, Kunihito et al.Thin solid films. 2010, Vol 518, Num 13, pp 3566-3569, issn 0040-6090, 4 p.Conference Paper

Effects of VUV/UV radiation and oxygen radicals on low-temperature sterilization in surface-wave excited O₂ plasmaYING ZHAO; SINGH, Mrityunjai K; OGINO, Akihisa et al.Thin solid films. 2010, Vol 518, Num 13, pp 3590-3594, issn 0040-6090, 5 p.Conference Paper

SiO₂ film deposition on the inner wall of a narrow polymer tube by a capacitively coupled μplasmaYOSHIKI, Hiroyuki; MITSUI, Toshiaki; SATO, Takaya et al.Thin solid films. 2010, Vol 518, Num 13, pp 3526-3530, issn 0040-6090, 5 p.Conference Paper

Silicon oxide synthesized using an atmospheric pressure microplasma jet from a tetraethoxysilane and oxygen mixtureYI DING; QINGTAO PAN; JIE JIN et al.Thin solid films. 2010, Vol 518, Num 13, pp 3487-3491, issn 0040-6090, 5 p.Conference Paper

Study of plasma enhanced chemical vapor deposition of ZnO films by non-thermal plasma jet at atmospheric pressureITO, Yosuke; SAKAI, Osamu; TACHIBANA, Kunihide et al.Thin solid films. 2010, Vol 518, Num 13, pp 3513-3516, issn 0040-6090, 4 p.Conference Paper

Synthesis evaluation of nitrogen atom encapsulated fullerenes by optical emission spectra in nitrogen plasmasMIYANAGA, S; KANEKO, T; ISHIDA, H et al.Thin solid films. 2010, Vol 518, Num 13, pp 3509-3512, issn 0040-6090, 4 p.Conference Paper

Two-temperature non-chemical equilibrium analysis of Ar-CH₄-O₂ ICTP at reduced pressureSHARIF ABDULLAH AL-MAMUN; TANAKA, Y; UESUGI, Y et al.Thin solid films. 2010, Vol 518, Num 13, pp 3535-3540, issn 0040-6090, 6 p.Conference Paper

Deposition of hydrophobic nano-coatings with low-pressure radio frequency CH₂F₂/Ar plasma processingCHUN HUANG; PAN, Chien-Hsuan; LIU, Chi-Hung et al.Thin solid films. 2010, Vol 518, Num 13, pp 3570-3574, issn 0040-6090, 5 p.Conference Paper

Relationship between Ba atom emission and electrode temperature in a low-pressure fluorescent lampYAMAGATA, Yukihiko; KAI, Makoto; NAITO, Sho et al.Thin solid films. 2010, Vol 518, Num 13, pp 3449-3452, issn 0040-6090, 4 p.Conference Paper

Synthesis of single-walled carbon nanotubes by arc-vaporization under high gravity conditionGUODONG TAN; MIENO, Tetsu.Thin solid films. 2010, Vol 518, Num 13, pp 3541-3545, issn 0040-6090, 5 p.Conference Paper

Atomic-scale cellular model and profile simulation of Si etching: Formation of surface roughness and residueTSUDA, Hirotaka; MORI, Masahito; TAKAO, Yoshinori et al.Thin solid films. 2010, Vol 518, Num 13, pp 3475-3480, issn 0040-6090, 6 p.Conference Paper