Advances in resist materials and processing technology XXIV (26-28 February, 2007, San Jose, California, USA)Lin, Qinghuang.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6638-9, 2 vol, isbn 978-0-8194-6638-9Conference Proceedings

A novel method for characterizing resist performanceVAN STEENWINCKEL, D; GRONHEID, R; LAMMERS, J. H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190V.1-65190V.11, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Gray Scale lithography of photosensitive polyimide and its graphitizationAKBAR, S; IMHOFF, E; KUB, F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65191I.1-65191I.12, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Lithography beyond 32nm : A role for imprint?MELLIAR-SMITH, Mark.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6638-9, Part I, xxiii-xxxviConference Paper

Photoresist adhesion effect of resist reflow processPARK, Joon-Min; LEE, Ji-Eun; HONG, Joo-Yoo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193O.1-65193O.11, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Study on diazonaphthoquinone positive photoresist composition for LCDFANGYU ZHOU; YINGQUAN ZOU; ZHANBIN ZHANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65194C.1-65194C.9, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Component segregation in model chemically amplified resistsWOODWARD, John T; FEDYNYSHYN, Theodore H; ASTOLFI, David K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651915.1-651915.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

FTIR measurements of compositional heterogeneitiesSHUHUI KANG; VOGT, Bryan D; WU, Wen-Li et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651916.1-651916.9, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Fundamental limits to EUV photoresistGALLATIN, Gregg M; NAULLEAU, Patrick; BRAINARD, Robert et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651911.1-651911.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

High performance 193nm photoresists based on fluorosulfonamideWENJIE LI; CHEN, Kuang-Jung; SUGIURA, Makoto et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190F.1-65190F.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Modified polymer architecture for immersion lithographySANG SOO KIM; JEONG WOO KIM; CHEOL KYU BOK et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65191W.1-65191W.12, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Optimization of hardmask for dual anti-reflection layersKIM, Ju-Hyun; KIM, Jeahee; KIM, Keeho et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65192W.1-65192W.6, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Resist evaluation for EUV application at ASETGOO, Doohoon; TANAKA, Yuusuke; KIKUCHI, Yukiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65191M.1-65191M.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

A study on the material design for the reduction of LWRTSUBAKI, Hideaki; YAMANAKA, Tsukasa; NISHIYAMA, Fumiyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651918.1-651918.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Characterization of photoacid redeposition in 193 nm photoresistsWALLOW, Thomas; PLAT, Marina; ZHANPING ZHANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190T.1-65190T.9, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Mechanistic simulation of line-edge roughnessBIAFORE, John J; SMITH, Mark D; ROBERTSON, Stewart A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190Y.1-65190Y.17, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Nonchemically amplified resists for deep UV lithographyGANESAN, Ramakrishnan; KIM, Sumin; SEUL KI YOUN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65192J.1-65192J.5, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Study on the reduction of defects in immersion lithographyBAN, Keundo; PARK, Sarohan; BOK, Cheolkyu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65191V.1-65191V.9, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Automatic viscosity-controlled production of photoresistWOO SOK CHANG; MONOVOUKAS, Christos; TANAKA, Michael et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193N.1-65193N.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Hybrid optical : Electron-beam resistsLENNON, D. M; SPECTOR, S. J; FEDYNYSHYN, T. H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190H.1-65190H.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Identifying materials limits of chemically amplified photoresistsWU, Wen-Li; PRABHU, Vivek M; LIN, Eric K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651902.1-651902.11, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Novel developers for positive tone EUV photoresistsSHARMA, Geeta; SHARMA, Shalini; RATTNER, Michael et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65190P.1-65190P.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Novel materials design for immersion lithographyWADA, Kenji; KANNA, Shinichi; KANDA, Hiromi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651908.1-651908.6, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Outlook for potential third-generation immersion fluidsLOPEZ-GEJO, Juan; KUNJAPPU, Joy T; ZHOU, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651921.1-651921.10, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Polymer structure modifications for immersion leaching controlSANG HYANG LEE; JUNG WOO KIM; KEUN DO BAN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 651925.1-651925.9, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper