Abnormalities associated with grain growth in solid solution Cu(Ni) thin filmsBRONS, J. G; THOMPSON, G. B.Thin solid films. 2014, Vol 558, pp 170-175, issn 0040-6090, 6 p.Article

Characteristics of tantalum-doped silicon oxide-based resistive random access memoryHSIEH, Wei-Kang; LAM, Kin-Tak; CHANG, Shoou-Jinn et al.Materials science in semiconductor processing. 2014, Vol 27, pp 293-296, issn 1369-8001, 4 p.Article

Controlled growth of crystalline g-C₃N₄ nanocone arrays by plasma sputtering reaction depositionLEILEI GUAN; NING XU; XUJUN LIU et al.Carbon (New York, NY). 2014, Vol 79, pp 578-589, issn 0008-6223, 12 p.Article

Crystal Growth, Structure, and Transport Properties of the Charge-Transfer Salt Picene/2,3,5,6-Tetrafluoro-7,7,8,8-tetracyanoquinodimethaneMAHNS, Benjamin; KATAEVA, Olga; RENGER, Roman et al.Crystal growth & design. 2014, Vol 14, Num 3, pp 1338-1346, issn 1528-7483, 9 p.Article

Dependence of the performance of inverted polymer solar cells on thickness of an electron selective ZnO layer deposited by magnetron sputteringFENG ZHU; XIAOHONG CHEN; LIN ZHOU et al.Thin solid films. 2014, Vol 551, pp 131-135, issn 0040-6090, 5 p.Article

Depth profiling organic light-emitting devices by gas-cluster ion beam sputtering and X-ray photoelectron spectroscopyERICKSON, Nicholas C; RAMAN, Sankar N; HAMMOND, John S et al.Organic electronics (Print). 2014, Vol 15, Num 11, pp 2988-2992, issn 1566-1199, 5 p.Article

Effect of Substrate Bias Voltage on the Physical Properties of Zirconium Nitride (ZrN) Films Deposited by Mid Frequency Reactive Magnetron SputteringKAVITHA, A; KANNAN, R; LOGANATHAN, S et al.International journal of nanoscience (Print, Singapore). 2014, Vol 13, Num 2, issn 0219-581X, 1450015.1-1450015.7Article

Effects of Al concentrations on the microstructure and mechanical properties of Ti-Al-N films deposited by RF-ICPIS enhanced magnetron sputteringDONGKE LI; JUNFANG CHEN; CHANGWEI ZOU et al.Journal of alloys and compounds. 2014, Vol 609, pp 239-243, issn 0925-8388, 5 p.Article

Effects of annealing on the structural and optical properties of zinc sulfide thin films deposited by ion beam sputteringKENNEDY, J; MURMU, P. P; GUPTA, P. S et al.Materials science in semiconductor processing. 2014, Vol 26, pp 561-566, issn 1369-8001, 6 p.Article

Evolution and change of He bubbles in He-containing Ti films upon thermal treatment studied by small-angle X-ray scattering and transmission electron microscopyGUANGAI SUN; ERDONG WU; YI LIU et al.Thin solid films. 2014, Vol 558, pp 125-133, issn 0040-6090, 9 p.Article

Fabrication and characterization of gold coated hollow silicon microneedle array for drug deliveryVINAYAKUMAR, K. B; HEGDE, G. M; NAYAK, M. M et al.Microelectronic engineering. 2014, Vol 128, pp 12-18, issn 0167-9317, 7 p.Article

Fabrication of CuInSe₂ thin film solar cell with selenization of double layered precursors from Cu₂Se and In₂Se₃ binaryCHAEHWAN JEONG; JIN HYEOK KIM.Thin solid films. 2014, Vol 550, pp 660-664, issn 0040-6090, 5 p.Article

Formation of submicron buckling patterns in thin metal film on micro-scale substrate by pyrolysis of photoresistYANG GAO; TIELIN SHI; HUI ZHENG et al.Thin solid films. 2014, Vol 550, pp 156-163, issn 0040-6090, 8 p.Article

Growth of ZnO bulk crystals: A reviewTRIBOULET, Robert.Progress in crystal growth and characterization of materials. 2014, Vol 60, Num 1, pp 1-14, issn 0960-8974, 14 p.Article

Growth of polycrystalline Ag/Ni multilayers at room temperatureMUHAMMAD, Y; MAGNUS, F; THERSLEFF, T et al.Thin solid films. 2014, Vol 558, pp 184-188, issn 0040-6090, 5 p.Article

Growth of polycrystalline indium aluminum nitride thin films on silicon (111) substratesAFZAL, Naveed; DEVARAJAN, Mutharasu; IBRAHIM, Kamarulazizi et al.Materials science in semiconductor processing. 2014, Vol 27, pp 975-984, issn 1369-8001, 10 p.Article

High Mobility and Stability of Thin-Film Transistors Using Silicon-Doped Amorphous Indium Tin Oxide SemiconductorsSEO, T. W; KIM, Hyun-Suk; LEE, Kwang-Ho et al.Journal of electronic materials. 2014, Vol 43, Num 9, pp 3177-3183, issn 0361-5235, 7 p.Article

High quality aluminium doped zinc oxide target synthesis from nanoparticulate powder and characterisation of sputtered thin filmsISHERWOOD, P. J. M; NEVES, N; BOWERS, J. W et al.Thin solid films. 2014, Vol 566, pp 108-114, issn 0040-6090, 7 p.Article

High-rate deposition of AlTiN and related coatings with dense morphology by central cylindrical direct current magnetron sputteringJILEK, M; JILEK, M; JILEK, M; JILEK, M; MARTIN, F. Mendez et al.Thin solid films. 2014, Vol 556, pp 361-368, issn 0040-6090, 8 p.Article

Highly reliable molecular-pore-stacking (MPS)/Cu interconnects featuring best combination of post-etching treatment and resputtering processesOSHIDA, Daisuke; KUME, Ippei; KATSUYAMA, Hirokazu et al.Microelectronic engineering. 2014, Vol 118, pp 72-78, issn 0167-9317, 7 p.Article

Influence of hydrostatic pressure on superconducting properties of niobium thin filmPRISTAS, Gabriel; GABANI, Slavomír; GAZO, Emil et al.Thin solid films. 2014, Vol 556, pp 470-474, issn 0040-6090, 5 p.Article

Magnetic properties of Co―N thin films deposited by reactive sputteringSILVA, C; VOVK, A; DA SILVA, R. C et al.Thin solid films. 2014, Vol 556, pp 125-127, issn 0040-6090, 3 p.Article

Multi-scale kinetic surface roughening of reactive-sputtered TaN thin films characterized by wavelet transform approachYANG, J. J; MIAO, F. M; TANG, J et al.Thin solid films. 2014, Vol 550, pp 367-372, issn 0040-6090, 6 p.Article

On the formation of the porous structure in nanostructured a-Si coatings deposited by dc magnetron sputtering at oblique anglesGODINHO, V; MOSKOVKIN, P; ALVAREZ, R et al.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 35, issn 0957-4484, 355705.1-355705.11Article

Preparation, microstructure and photoelectrical properties of Tantalum-doped zinc oxide transparent conducting filmsYUNLANG CHENG; LING CAO; GANG HE et al.Journal of alloys and compounds. 2014, Vol 608, pp 85-89, issn 0925-8388, 5 p.Article