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Copper interconnects, new contact metallurgies/structures, and low-k interlevel dielectrics II (Orlando FL, 12-17 October 2003)Mathad, G.S; Rathore, H.S; Konda, K et al.Proceedings - Electrochemical Society. 2003, issn 0161-6374, isbn 1-56677-390-3, IX, 276 p, isbn 1-56677-390-3Conference Proceedings

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