Pascal and Francis Bibliographic Databases

Help

Search results

Your search

kw.\*:("52.80.Pi")

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 42

  • Page / 2
Export

Selection :

  • and

An RF microplasma facility development for medical applicationsPEREZ-MARTINEZ, J. A; PENA-EGUILUZ, R; LOPEZ-CALLEJAS, R et al.Surface & coatings technology. 2007, Vol 201, Num 9-11, pp 5684-5687, issn 0257-8972, 4 p.Conference Paper

Synchronous plasma enhancement in RF-driven plasma source for ion implantationDIPLASU, C; SURMEIAN, A; GROZA, A et al.Surface & coatings technology. 2009, Vol 203, Num 19, pp 2858-2862, issn 0257-8972, 5 p.Article

Plasma-based ion process in the dual-plasma configurationIKEHATA, Takashi; NAKAO, Ryoki; SATO, Naoyuki et al.Surface & coatings technology. 2007, Vol 201, Num 15, pp 6561-6564, issn 0257-8972, 4 p.Conference Paper

Electrical behaviour of SiOxNy thin films and correlation with structural defectsREBIB, F; TOMASELLA, E; AIDA, S et al.Applied surface science. 2006, Vol 252, Num 15, pp 5607-5610, issn 0169-4332, 4 p.Conference Paper

The characterization of fluorocarbon films on NiTi alloy by magnetron sputteringLI, L; ZI, F. T; ZHENG, Y. F et al.Applied surface science. 2008, Vol 255, Num 2, pp 432-434, issn 0169-4332, 3 p.Conference Paper

Wave analysis in microwave-excited plasma reactor using MSP antennaTSUJI, A; YASAKA, Y; TAKENO, H et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5306-5309, issn 0257-8972, 4 p.Conference Paper

Plasma distribution in the slender bore excited by coaxial rf electrodeCUI, J. T; TIAN, X. B; YANG, S. Q et al.Surface & coatings technology. 2007, Vol 201, Num 15, pp 6651-6654, issn 0257-8972, 4 p.Conference Paper

Electromagnetic sources of nonuniformity in large area capacitive reactorsHOWLING, A. A; SANSONNENS, L; HOLLENSTEIN, Ch et al.Thin solid films. 2007, Vol 515, Num 12, pp 5059-5064, issn 0040-6090, 6 p.Conference Paper

Pulsed DC discharge for synthesis of conjugated plasma polymerized aniline thin filmBARMAN, Tapan; PAL, Arup R.Applied surface science. 2012, Vol 259, pp 691-697, issn 0169-4332, 7 p.Article

Modelling of a spherical electric discharge at atmospheric pressure under higher modes of incident microwavesRAFATOV, I. R; KOZLOV, P. V; LELEVKIN, V. M et al.Contributions to plasma physics (1985). 2005, Vol 45, Num 2, pp 139-154, issn 0863-1042, 16 p.Article

Synthesis of carbon nanotubes and iron oxide nanoparticles in MW plasma torch with Fe(CO)5 in gas feedZAJICKOVA, Lenka; SYNEK, Petr; JASEK, Ondrej et al.Applied surface science. 2009, Vol 255, Num 10, pp 5421-5424, issn 0169-4332, 4 p.Conference Paper

Large area SiH4/H2 VHF plasma produced at high pressure using multi-rod electrodeYAMAUCHI, Yasuhiro; TAKEUCHI, Yoshiaki; TAKATSUKA, Hiromu et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5668-5671, issn 0257-8972, 4 p.Conference Paper

Optical emission spectroscopy investigation of sputtering discharge used for SiOxNy thin films deposition and correlation with the film compositionREBIB, F; TOMASELLA, E; THOMAS, L et al.Applied surface science. 2006, Vol 252, Num 15, pp 5611-5614, issn 0169-4332, 4 p.Conference Paper

Travelling -wave -sustained dischargesSCHLÜTER, Hans; SHIVAROVA, Antonia.Physics reports. 2007, Vol 443, Num 4-6, pp 121-255, issn 0370-1573, 135 p.Article

Effect of supersonic ion beams on the triple probe measurementWOO, H.-J; CHUNG, K.-S; CHOI, Y.-S et al.Contributions to plasma physics (1985). 2006, Vol 46, Num 5-6, pp 451-454, issn 0863-1042, 4 p.Conference Paper

Open-air silicon etching by H2-He-CH4 flowing cold plasmaCHAUDHARY, Khaliq; INOMATA, Kiyoto; YOSHIMOTO, Mamoru et al.Materials letters (General ed.). 2003, Vol 57, Num 22-23, pp 3406-3411, issn 0167-577X, 6 p.Article

RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during depositionCHOPADE, S. S; BARVE, S. A; THULASI RAMAN, K. H et al.Applied surface science. 2013, Vol 285, pp 524-531, issn 0169-4332, 8 p., bArticle

Effects of crystallinity and grain size on photocatalytic activity of titania filmsMAEDA, Masahiko; WATANABE, Temyoshi.Surface & coatings technology. 2007, Vol 201, Num 22-23, pp 9309-9312, issn 0257-8972, 4 p.Conference Paper

Microwave breakdown field in a resonant spherical cavityTOMALA, R; JORDAN, U; ANDERSON, D et al.Contributions to plasma physics (1985). 2006, Vol 46, Num 4, pp 287-293, issn 0863-1042, 7 p.Article

Activation energy of an asymmetrical, radio frequency discharge with methaneHEGEMANN, D; SCHÜTZ, U.Thin solid films. 2005, Vol 491, Num 1-2, pp 96-103, issn 0040-6090, 8 p.Article

Feasibility study of the sterilization of pork and human skin surfaces by atmospheric pressure plasmasSE YOUN MOON; KIM, D. B; GWEON, B et al.Thin solid films. 2009, Vol 517, Num 14, pp 4272-4275, issn 0040-6090, 4 p.Conference Paper

High rate growth of high-quality microcrystalline silicon films from plasma by interconnected multi-hollow cathodeNIIKURA, Chisato; ITAGAKI, Naho; MATSUDA, Akihisa et al.Surface & coatings technology. 2007, Vol 201, Num 9-11, pp 5463-5467, issn 0257-8972, 5 p.Conference Paper

Sheath potential difference studies in low-pressure high-frequency capacitive RF plasma as a fundamental research for ion energy impinging on the material surfaceLI, Zhi-Gang; YUCHENG DING.Surface & coatings technology. 2006, Vol 200, Num 18-19, pp 5655-5662, issn 0257-8972, 8 p.Article

Plasma process for development of a bulk heterojunction optoelectronic device: A highly sensitive UV detectorSHARMA, Shyamalima; PAL, Arup R; CHUTIA, Joyanti et al.Applied surface science. 2012, Vol 258, Num 20, pp 7897-7906, issn 0169-4332, 10 p.Article

Output characteristics of a cataphoresis He-Sr+ recombination laserWANG, Y. J; PAN, B. L; CHEN, L et al.Optics communications. 2008, Vol 281, Num 21, pp 5405-5408, issn 0030-4018, 4 p.Article

  • Page / 2