kw.\*:("62.20.Q")
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The influence of the ion current density on plasma nitriding processOCHOA, E. A; FIGUEROA, C. A; ALVAREZ, F et al.Surface & coatings technology. 2005, Vol 200, Num 7, pp 2165-2169, issn 0257-8972, 5 p.Article
Growth of nonlinear optical material: L-arginine hydrochloride and its characterisationMEERA, K; MURALIDHARAN, R; DHANASEKARAN, R et al.Journal of crystal growth. 2004, Vol 263, Num 1-4, pp 510-516, issn 0022-0248, 7 p.Article
