kw.\*:("81.40.N;52.75.R Nitriding")
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The influence of the ion current density on plasma nitriding processOCHOA, E. A; FIGUEROA, C. A; ALVAREZ, F et al.Surface & coatings technology. 2005, Vol 200, Num 7, pp 2165-2169, issn 0257-8972, 5 p.Article
