Sputtered TiO₂ thin films with NiO additives for hydrogen detectionKOSC, I; HOTOVY, I; REHACEK, V et al.Applied surface science. 2013, Vol 269, pp 110-115, issn 0169-4332, 6 p.Article

Effects of magnesium film thickness and annealing temperature on formation of Mg₂Si films on silicon (111) substrate deposited by magnetron sputteringQINGQUAN XIAO; QUAN XIE; XIANGQIAN SHEN et al.Applied surface science. 2011, Vol 257, Num 17, pp 7800-7804, issn 0169-4332, 5 p.Article

Optical properties of p-type CuAlO₂ thin film grown by rf magnetron sputteringMIN FANG; HAIPING HE; BIN LU et al.Applied surface science. 2011, Vol 257, Num 20, pp 8330-8333, issn 0169-4332, 4 p.Article

Physical and electrochemical study of platinum thin films deposited by sputtering and electrochemical methodsQUINONES, C; VALLEJO, W; MESA, F et al.Applied surface science. 2011, Vol 257, Num 17, pp 7545-7550, issn 0169-4332, 6 p.Article

The structure and tribological properties of aluminum/carbon nanocomposite thin films synthesized by reactive magnetron sputteringSHENGGUO ZHOU; LIPING WANG; QUNJI XUE et al.Surface and interface analysis. 2011, Vol 43, Num 7, pp 1057-1063, issn 0142-2421, 7 p.Article

Effect of composition and deposition temperature on the characteristics of Ga doped ZnO thin filmsKIM, Y. H; JEONG, J; LEE, K. S et al.Applied surface science. 2010, Vol 257, Num 1, pp 109-115, issn 0169-4332, 7 p.Article

Effect of sputtering anisotropic ejection on the optical properties and residual stress of Nb₂O₅ thin filmsTIEN, Chuen-Lin.Applied surface science. 2010, Vol 257, Num 2, pp 481-486, issn 0169-4332, 6 p.Article

Improved electron emission characteristics of ZnO nano-gap with Pd filmsSILIANG XIONG; ZHONGXIAO SONG; SHENGLI WU et al.Applied surface science. 2010, Vol 256, Num 23, pp 7323-7326, issn 0169-4332, 4 p.Article

Preparation and structural properties of YBCO films grown on GaN/c-sapphire hexagonal substrateCHROMIK, S; GIERLOWSKI, P; ESPINOS, J. P et al.Applied surface science. 2010, Vol 256, Num 18, pp 5618-5622, issn 0169-4332, 5 p.Conference Paper

Sputtered and laser recrystalized phosphorus-doped zinc oxideSÄMANN, Marc; EISELE, Sebastian; BILGER, Gerhard et al.Surface and interface analysis. 2010, Vol 42, Num 10-11, pp 1570-1572, issn 0142-2421, 3 p.Conference Paper

Microstructure and tribological properties of TiN, TiC and Ti(C, N) thin films prepared by closed-field unbalanced magnetron sputtering ion platingGUOJUN ZHANG; BIN LI; BAILING JIANG et al.Applied surface science. 2009, Vol 255, Num 21, pp 8788-8793, issn 0169-4332, 6 p.Article

Sn-CeO₂ thin films prepared by rf magnetron sputtering : XPS and SIMS studyMASEK, Karel; VACLAVU, Michal; BABOR, Petr et al.Applied surface science. 2009, Vol 255, Num 13-14, pp 6656-6660, issn 0169-4332, 5 p.Article

Spectroscopic ellipsometry of SiO₂/CdTe nanocomposite thin films prepared by dc magnetron sputteringBERA, S. K; BHATTACHARYYA, D; GHOSH, R et al.Applied surface science. 2009, Vol 255, Num 13-14, pp 6634-6640, issn 0169-4332, 7 p.Article

Formation of p-type ZnMgO thin films by In-N codoping methodGONG, L; YE, Z. Z; LU, J. G et al.Applied surface science. 2009, Vol 256, Num 3, pp 627-630, issn 0169-4332, 4 p.Article

Optical properties of La₂O₃ doped diamond-like carbon filmsZHENYU ZHANG; FENGWEI HUO; ZHENYUAN JIA et al.Applied surface science. 2008, Vol 254, Num 22, pp 7193-7197, issn 0169-4332, 5 p.Article

The morphology and optical properties of Cr-doped ZnO films grown using the magnetron co-sputtering methodHU, Y. M; CHEN, Y. T; ZHONG, Z. X et al.Applied surface science. 2008, Vol 254, Num 13, pp 3873-3878, issn 0169-4332, 6 p.Article

Thermochromic VO₂ thin films synthesized by rf-inverted cylindrical magnetron sputteringKANA KANA, J. B; NDJAKA, J. M; OWONO ATEBA, P et al.Applied surface science. 2008, Vol 254, Num 13, pp 3959-3963, issn 0169-4332, 5 p.Article

Fabrication of multilayered Ge nanocrystals embedded in SiO_xGeNy filmsFEI GAO; GREEN, Martin A; CONIBEER, Gavin et al.Applied surface science. 2008, Vol 254, Num 22, pp 7527-7530, issn 0169-4332, 4 p.Article

Single domain epitaxial growth of yttria-stabilized zirconia on Si(1 1 1) substrateKANEKO, S; AKIYAMA, K; ITO, T et al.Ceramics international. 2008, Vol 34, Num 4, pp 1047-1050, issn 0272-8842, 4 p.Conference Paper

Advantages of modular electronics for large area sputter coatingsDE BOSSCHER, Wilmert; LACRES, Ann; STAELENS, Koen et al.American Ceramic Society bulletin. 2007, Vol 86, Num 1, pp 18-20, issn 0002-7812, 3 p.Article

Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium-zinc-oxide filmsLIM, W. T; STAFFORD, L; NORTON, D. P et al.Applied surface science. 2007, Vol 253, Num 23, pp 9228-9233, issn 0169-4332, 6 p.Article

Effect of substrate bias voltages on the diffusion barrier properties of Zr-N films in Cu metallizationYING WANG; CHUNHUI ZHAO; ZHONGXIAO SONG et al.Applied surface science. 2007, Vol 253, Num 22, pp 8858-8862, issn 0169-4332, 5 p.Article

The effect of annealing time on r.f. magnetron sputtered La₃Ga₅SiO₁₄ filmsWANG, Feng-Wei; YI HU; LIN, Hur-Lon et al.Journal of materials science. 2007, Vol 42, Num 17, pp 7307-7310, issn 0022-2461, 4 p.Article

Effect of oxygen partial pressure on the structural and optical properties of ZnO film deposited by reactive sputteringZHANG, J. P; HE, G; ZHU, L. Q et al.Applied surface science. 2007, Vol 253, Num 24, pp 9414-9421, issn 0169-4332, 8 p.Article

Dielectric properties of amorphous BaTiO₃ films deposited by RF magnetron sputteringKAMEL, F. El; GONON, P; JOMNI, F et al.Journal of the European Ceramic Society. 2007, Vol 27, Num 13-15, pp 3807-3809, issn 0955-2219, 3 p.Conference Paper