Adherent diamond film deposited on Cu substrate by carbon transport from nanodiamond buried under Pt interlayerXUEZHANG LIU; QIUPING WEI; ZHIMING YU et al.Applied surface science. 2013, Vol 265, pp 714-719, issn 0169-4332, 6 p.Article

Influence of deposition pressure on hydrogenated amorphous carbon films prepared by d.c.-pulse plasma chemical vapor depositionCHENGBING WANG; JING SHI; RONGBIN XIA et al.Surface and interface analysis. 2013, Vol 45, Num 4, pp 800-804, issn 0142-2421, 5 p.Article

Tribological and cutting behavior of silicon nitride tools coated with monolayer-and multilayer-microcrystalline HFCVD diamond filmsNAICHAO CHEN; BIN SHEN; GUODONG YANG et al.Applied surface science. 2013, Vol 265, pp 850-859, issn 0169-4332, 10 p.Article

Fabrication and electron field-emission of carbon nanofibers grown on silicon nanoporous pillar arrayHAIYAN WANG; YONGQIANG WANG; RENZHONG XUE et al.Applied surface science. 2012, Vol 261, pp 219-222, issn 0169-4332, 4 p.Article

Rhenium coating prepared on carbon substrate by chemical vapor depositionYONGGANG TONG; SHUXIN BAI; HONG ZHANG et al.Applied surface science. 2012, Vol 261, pp 390-395, issn 0169-4332, 6 p.Article

Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methodsTANAKA, Yoriko; FURUTA, Masahiro; KURIYAMA, Koichi et al.Electrochimica acta. 2011, Vol 56, Num 3, pp 1172-1181, issn 0013-4686, 10 p.Article

Morphology transition of ZnO films with DMZn flow rate in MOCVD processLIANG, J. H; LAI, H. Y; CHEN, Y. J et al.Applied surface science. 2010, Vol 256, Num 23, pp 7305-7310, issn 0169-4332, 6 p.Article

The effect of Ar flow rate in the growth of SiGe:H thin films by PECVDZEGUO TANG; WENBIN WANG; DESHENG WANG et al.Applied surface science. 2010, Vol 256, Num 23, pp 7032-7036, issn 0169-4332, 5 p.Article

The optoelectronic properties of silicon films deposited by inductively coupled plasma CVDYANLI QIN; HENGQING YAN; FEI LI et al.Applied surface science. 2010, Vol 257, Num 3, pp 817-822, issn 0169-4332, 6 p.Article

Synthesis and characterization of silicon carbonitride films by plasma enhanced chemical vapor deposition (PECVD) using bis(dimethylamino)dimethylsilane (BDMADMS), as membrane for a small molecule gas separationKAFROUNI, W; ROUESSAC, V; JULBE, A et al.Applied surface science. 2010, Vol 257, Num 4, pp 1196-1203, issn 0169-4332, 8 p.Article

Thermal stability and chemical bonding states of AlO_xN_y/Si gate stacks revealed by synchrotron radiation photoemission spectroscopyHE, G; TOYODA, S; SHIMOGAKI, Y et al.Applied surface science. 2010, Vol 257, Num 5, pp 1638-1642, issn 0169-4332, 5 p.Article

Structure and properties of chemically prepared nanographene islands characterized by scanning tunneling microscopyYAMAMOTO, Mayu; OBATA, Seiji; SAIKI, Koichiro et al.Surface and interface analysis. 2010, Vol 42, Num 10-11, pp 1637-1641, issn 0142-2421, 5 p.Conference Paper

Nanoparticulate cerium dioxide and cerium dioxide-titanium dioxide composite thin films on glass by aerosol assisted chemical vapour depositionQURESHI, Uzma; DUNNILL, Charles W; PARKIN, Ivan P et al.Applied surface science. 2009, Vol 256, Num 3, pp 852-856, issn 0169-4332, 5 p.Article

Growth of carbon nanotubes on stainless steel substrates by DC-PECVDDAO QUANG DUY; HYUN SUK KIM; DANG MO YOON et al.Applied surface science. 2009, Vol 256, Num 4, pp 1065-1068, issn 0169-4332, 4 p.Conference Paper

Selected properties of a-C:H PACVD coatingsCERNY, F; JECH, V; KONVICKOVA, S et al.Applied surface science. 2009, Vol 256, Num 3S, issn 0169-4332, S22-S25, NSConference Paper

Use of a PECVD-PVD process for the deposition of copper containing organosilicon thin films on steelDANIEL, A; LE PEN, C; ARCHAMBEAU, C et al.Applied surface science. 2009, Vol 256, Num 3S, issn 0169-4332, S82-S85, NSConference Paper

Low-Temperature Thermolysis Behavior of Tetramethyl-and TetraethyldistibinesBAHLAWANE, Naoufal; REILMANN, Frank; SCHULZ, Stephan et al.Journal of the American Society for Mass Spectrometry. 2008, Vol 19, Num 9, pp 1336-1342, issn 1044-0305, 7 p.Article

Nature of dark-brown SnO₂ films prepared by a chemical vapor deposition methodMATSUSHIMA, Yuta; MAEDA, Kazuyuki; SUZUKI, Takeyuki et al.Nippon seramikkusu kyokai gakujutsu ronbunshi. 2008, Vol 116, Num 9, pp 989-993, issn 0914-5400, 5 p.Article

Temperature and substrate dependence of structure and growth mechanism of carbon nanofiberCHUANG, Chia-Chih; LIU, Wei-Long; CHEN, Wen-Jauh et al.Applied surface science. 2008, Vol 254, Num 15, pp 4681-4687, issn 0169-4332, 7 p.Article

A study on electrical and mechanical properties of hybrid-polymer thin films by a controlled TEOS bubbling ratioCHO, S.-J; BAE, I.-S; JEONG, H.-D et al.Applied surface science. 2008, Vol 254, Num 23, pp 7817-7820, issn 0169-4332, 4 p.Conference Paper

Application of spectral reflectance to the monitoring of ZnO nanorod growthGHONG, T. H; KIM, Y. D; AHN, E et al.Applied surface science. 2008, Vol 255, Num 3, pp 746-748, issn 0169-4332, 3 p.Conference Paper

Characteristics of La₂O₃ thin films deposited using metal organic chemical vapor deposition with different oxidant gasHYO JUNE KIM; JIN HYUNG JUN; DOO JIN CHOI et al.Ceramics international. 2008, Vol 34, Num 4, pp 953-956, issn 0272-8842, 4 p.Conference Paper

Effect of H₂ and O₂ plasma etching treatment on the surface of diamond-like carbon thin filmDEOK YONG YUN; WON SEOK CHOI; YONG SEOB PARK et al.Applied surface science. 2008, Vol 254, Num 23, pp 7925-7928, issn 0169-4332, 4 p.Conference Paper

Effect of hydrogen content on the ZnO thin films on the surface of polyethylene terephthalate substrate through electron cyclotron resonance-metal organic chemical vapor depositionPARK, J. H; BYUN, D; JEON, B. J et al.Journal of materials science. 2008, Vol 43, Num 10, pp 3417-3423, issn 0022-2461, 7 p.Conference Paper

Formation of multiple nanoscale twin boundaries that emit intense light in indirect-gap AlGaAs epilayersOHNO, Y; SHODA, K; TAISHI, T et al.Applied surface science. 2008, Vol 254, Num 23, pp 7633-7637, issn 0169-4332, 5 p.Conference Paper