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Results 1 to 25 of 3724

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Fifth International Workshop on High Aspect Ration Micro Structure Technology, HARMST, Monterey, CA, USA, June 2003Microsystem technologies. 2005, Vol 11, Num 4-5, issn 0946-7076, 162 p.Conference Proceedings

Special issue featuring papers from the 14th Micromechanics Europe Workshop (MME'03)WOLFFENBUTTEL, R. F.Journal of micromechanics and microengineering (Print). 2004, Vol 14, Num 9, issn 0960-1317, 128 p.Conference Proceedings

Decomposition Analysis of Molecular Resists to further CD controlSHIONO, Daiju; HADA, Hideo; HIRAYAMA, Taku et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727330.1-727330.8, 2Conference Paper

Extreme ultraviolet (EUV) lithography (22-25 February 2010, San Jose, California, United States)La Fontaine, Bruno M.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 2 vol, 2, isbn 978-0-8194-8050-7 0-8194-8050-9Conference Proceedings

Metallic microstructures by electroforming from conducting polymer templatesHOLSTEIN, N; SCHANZ, G; KONYS, J et al.Microsystem technologies. 2005, Vol 11, Num 2-3, pp 179-185, issn 0946-7076, 7 p.Article

CD Uniformity improvement for Double-Patterning Lithography (Litho-Litho-Etch) Using Freezing ProcessSUGIMACHI, Hisanori; KOSUGI, Hitoshi; YAMAGUCHI, Yoshikazu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72731D.1-72731D.7, 2Conference Paper

A study of mask inspection method with pattern priority and printability checkTOKITA, Masakazu; TSUCHIYA, Hideo; INOUE, Takafumi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792A.1-7379A.9Conference Paper

Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughnessMORITA, Hiroshi; DOI, Masao.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727337.1-727337.8, 2Conference Paper

Reduction of resist charging effect by EB reticle writer EBM-7000SAITO, Masato; UGAJIN, Kunihiro; IKENAGA, Osamu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791A.1-73791A.8Conference Paper

25th European Mask and Lithography Conference (12-15 January 2009, Dresden, Germany)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, various pagings, isbn 978-0-8194-7770-5 0-8194-7770-2Conference Proceedings

Papers electronicsÖSTERBACKA, Ronald; HAN, Jin-Woo.Nanotechnology (Bristol. Print). 2014, Vol 25, Num 9, issn 0957-4484, [121 p.]Serial Issue

Fabrication Methods for the Manufacture of Sapphire MicropartsALLEN, David M; REDONDO, Roxana; DANY, Maximilien et al.Symposium on design, test, integration and packaging of MEMS-MOEMS. 2011, pp 29-34, isbn 978-2-355-00013-3, 1Vol, 6 p.Conference Paper

Post-Develop Blob Defect ReductionHARUMOTO, Masahiko; NEGORO, Sei; HISAI, Akihiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72730P.1-72730P.12, 2Conference Paper

Phase Stability, Phase Transformation and Reactive Phase Formation in Electronic MaterialsCHEN, Chih-Ming; FLANDORFER, Hans; CHEN, Sinn-Wen et al.Journal of electronic materials. 2012, Vol 41, Num 1, issn 0361-5235, 177 p.Conference Proceedings

Variable sensitivity detection (VSD) technology for screening SRAF nuisance defectsYAMASHITA, Kyoji; HARABE, Nobuyuki; HIRONO, Masatoshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737929.1-737929.8Conference Paper

2009 International Conference on Defects: Recognition, Imaging and Physics in Semiconductors (DRIP)EDELMAN, Piotr.Journal of electronic materials. 2010, Vol 39, Num 6, issn 0361-5235, 213 p.Conference Proceedings

Contact deformation of a micromechanical structureFUQIAN YANG.Journal of micromechanics and microengineering (Print). 2004, Vol 14, Num 2, pp 263-268, issn 0960-1317, 6 p.Article

Effects of step height on wall temperature of a microcombustorLIL, Z. W; CHOU, S. K; SHU, C et al.Journal of micromechanics and microengineering (Print). 2005, Vol 15, Num 1, pp 207-212, issn 0960-1317, 6 p.Article

2009 U.S. Workshop on the Physics and Chemistry of II-VI MaterialsSIVANANTHAN, S; DHAR, N. K; ANTER, Y et al.Journal of electronic materials. 2010, Vol 39, Num 7, issn 0361-5235, 295 p.Conference Proceedings

DRCPlus in a Router: Automatic Elimination of Lithography Hotspots using 2D Pattern Detection and CorrectionJIE YANG; RODRIGUEZ, Norma; OMEDES, Olivier et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7641, issn 0277-786X, isbn 978-0-8194-8055-2 0-8194-8055-X, 76410Q.1-76410Q.7Conference Paper

Layout pattern Minimization for Next-Generation TechnologiesJHAVERI, Tejas; STROJWAS, Andrzej J.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7641, issn 0277-786X, isbn 978-0-8194-8055-2 0-8194-8055-X, 764108.1-764108.12Conference Paper

Mask roughness induced LER: a rule of thumbMCCLINTON, Brittany M; NAULLEAU, Patrick P.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76362G.1-76362G.9, 2Conference Paper

A study of filling process for UV nanoimprint lithography using a fluid simulationYONEDA, Ikuo; NAKAGAWA, Yasutada; MIKAMI, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7271, issn 0277-786X, isbn 978-0-8194-7524-4 0-8194-7524-6, 72712A.1-72712A.7, 2Conference Paper

Analysis of the Effect of Point-of-Use Filtration on Microbridging DefectivityBRAGGIN, J; GRONHEID, R; CHENG, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72730S.1-72730S.10, 2Conference Paper

Development and implementation of PWQ on patterned wafer darkfield inspection systemsSTRELLER, Uwe; WENDT, Kay; WEHNER, Amo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72723J.1-72723J.9, 2Conference Paper

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