BESTIMMUNG DES ARGONGEHALTES IN PULVERMETALLURGISCH, DURCH HEISSISOSTATISCHES PRESSEN HERGESTELLTEN STAEHLEN UND LEGIERUNGEN = DETERMINATION OF THE ARGON CONTENT IN STEELS AND ALLOYS MANUFACTURED BY HOT ISOSTATIC COMPACTINGSCHMIDT J.1980; ARCH. EISENHUETTENWES.; DEU; DA. 1980-08; VOL. 51; NO 8; PP. 347-348; BIBL. 4 REF.Article

DETERMINATION OF SMALL AMOUNTS OF ARGON, HELIUM, NEON AND HYDROGEN IN POWDERED METALS OBTAINED IN INERT GAS MEDIUMANUFRIEN GS; ARBUZONA LA; BOLTENKOV BS et al.1983; ZURNAL ANALITICESKOJ HIMII; ISSN 0044-4502; SUN; DA. 1983; VOL. 38; NO 3; PP. 472-478; ABS. ENG; BIBL. 13 REF.Article

QUANTITATIVE DETERMINATION OF ARGON IN SPUTTERED FILMS BY WAVELENGTH-DISPERSIVE ELECTRON PROBE MICROANALYSISWILLICH P; OBERTROP D.1982; X-RAY SPECTROM.; ISSN 0049-8246; GBR; DA. 1982; VOL. 11; NO 1; PP. 32-34; BIBL. 8 REF.Article

ION- AND ELECTRON-EXCITED RESIDUAL-GAS ANALYSIS USING A SIMS INSTRUMENTWITTMACK K.1982; INT. J. MASS SPECTROM. ION PHYS.; ISSN 0020-7381; NLD; DA. 1982; VOL. 42; NO 1-2; PP. 43-50; BIBL. 13 REF.Article

DETERMINATION OF ARGON IN SPUTTERED SILICON FILMS BY ENERGY-DISPERSIVE X-RAY FLUORESCENCE SPECTROMETRYKAHNICKY DJ; MOUSTAKAS TD.1981; ANAL. CHEM. (WASH.); ISSN 0003-2700; USA; DA. 1981; VOL. 53; NO 12; PP. 1792-1795; BIBL. 23 REF.Article

DETERMINATION OF TRACES OF NITROGEN AND ARGON IN OXYGEN BY A SIMPLE GAS CHROMATOGRAPHIC METHODVERZELE M; VERSTAPPE M; SANDRA P et al.1981; J. CHROMATOGR.; ISSN 0021-9673; NLD; DA. 1981; VOL. 209; NO 3; PP. 455-457; BIBL. 3 REF.Article

MEASUREMENT OF METASTABLE ARGON IN AN INDUCTIVELY COUPLED ARGON PLASMA BY ATOMIC ABSORPTION SPECTROSCOPYUCHIDA H; TANABE K; NOJIRI Y et al.1980; SPECTROCHIM. ACTA, B; ISSN 502189; GBR; DA. 1980; VOL. 35; NO 11-12; PP. 881-883; BIBL. 20 REF.Article

THE USE OF AN OSCILLATING VANE GAUGE TO DETERMINE GAS COMPOSITION OF BINARY GAS MIXTURESDYKSTERHUIS FH.1979; VACUUM; GBR; DA. 1979; VOL. 29; NO 4-5; PP. 149-154; BIBL. 12 REF.Article

PROTON-INDUCED THICK-TARGET GAMMA-RAY YIELDS FOR THE ELEMENTAL ANALYSIS OF THE Z=3-9,11-21 ELEMENTSANTTILA A; HAENNINGEN R; RAISAENEN J et al.1981; J. RADIOANAL. CHEM.; ISSN 0022-4081; CHE; DA. 1981; VOL. 62; NO 1-2; PP. 293-306; BIBL. 18 REF.Article

CHARACTERISTIC NEGATIVE RESPONSE OF THE HELIUM IONIZATION DETECTORANDRAWES FF; GIBSON EK JR.1980; ANAL. CHEM. (WASH.); ISSN 0003-2700; USA; DA. 1980; VOL. 52; NO 6; PP. 846-851; BIBL. 12 REF.Article

PRECISE DETERMINATION OF DISSOLVED GASES IN SEA WATER BY SHIPBOARD GAS CHROMATOGRAPHYGAMO T; HORIBE Y.1980; BULL. CHEM. SOC. JPN.; ISSN 0009-2673; JPN; DA. 1980; VOL. 53; NO 10; PP. 2839-2842; BIBL. 21 REF.Article

SENSITIVITY OF ION INDUCED X-RAY ANALYSIS FOR SURFACE LAYERS ON THICK SILICON SUBSTRATESMANN R; BAUER C; GIPPNER P et al.1979; J. RADIOANAL. CHEM.; CHE; DA. 1979; VOL. 50; NO 1-2; PP. 217-228; BIBL. 18 REF.Article