kw.\*:("B2. Semiconducting silicon")
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Output estimation of Si-based photovoltaic modules with outdoor environment and output mapTAKAHASHI, H; FUKUSHIGE, S; MINEMOTO, T et al.Journal of crystal growth. 2009, Vol 311, Num 3, pp 749-752, issn 0022-0248, 4 p.Conference Paper
Structural trends in Si dots formation on SiC surfaces using CVD environmentPORTAIL, M; VEZIAN, S; TEISSEIRE, M et al.Journal of crystal growth. 2014, Vol 404, pp 157-163, issn 0022-0248, 7 p.Article
Czochralski growth of heavily tin-doped Si crystalsYONENAGA, I; TAISHI, T; INOUE, K et al.Journal of crystal growth. 2014, Vol 395, pp 94-97, issn 0022-0248, 4 p.Article
Influencing factors on the formation of the low minority carrier lifetime zone at the bottom of seed-assisted cast ingotsGENXIANG ZHONG; QINGHUA YU; XINMING HUANG et al.Journal of crystal growth. 2014, Vol 402, pp 65-70, issn 0022-0248, 6 p.Article
Photovoltaic materials and crystal growth research and development in the Gigawatt eraCISZEK, T. F.Journal of crystal growth. 2014, Vol 393, pp 2-6, issn 0022-0248, 5 p.Conference Paper
Numerical study on transport phenomena in a directional solidification process in the presence of travelling magnetic fieldsDROPKA, Natasha; MILLER, Wolfram; MENZEL, Robert et al.Journal of crystal growth. 2010, Vol 312, Num 8, pp 1407-1410, issn 0022-0248, 4 p.Conference Paper
Solid-source boron doping of float-zoned siliconCISZEK, T. F.Journal of crystal growth. 2004, Vol 264, Num 1-3, pp 116-122, issn 0022-0248, 7 p.Article
Strong and stable red photoluminescence from porous silicon prepared by Fe-contaminated siliconLEE, D. Y; PARK, J. W; BAE, I. H et al.Journal of crystal growth. 2004, Vol 260, Num 3-4, pp 394-399, issn 0022-0248, 6 p.Article
Three-dimensional oscillatory flow in a thin annular pool of silicon meltLI, You-Rong; IMAISHI, Nobuyuki; AZAMI, Takeshi et al.Journal of crystal growth. 2004, Vol 260, Num 1-2, pp 28-42, issn 0022-0248, 15 p.Article
Prediction of solid-liquid interface shape during CZ Si crystal growth using experimental and global simulationSHIRAISHI, Yutaka; MAEDA, Susumu; NAKAMURA, Kozo et al.Journal of crystal growth. 2004, Vol 266, Num 1-3, pp 28-33, issn 0022-0248, 6 p.Conference Paper
Suppression of short step bunching generated on 4H-SiC Si-face substrates with vicinal off-angleMASUMOTO, Keiko; TAMURA, Kentaro; KUDOU, Chiaki et al.Journal of crystal growth. 2014, Vol 401, pp 673-676, issn 0022-0248, 4 p.Conference Paper
Improved control of silicon nanowire growth by the vapor―liquid―solid method using a diffusion barrier layer between catalyst and substrateKOTO, Makoto; SHIMIZU, Tomohiro; SHINGUBARA, Shoso et al.Journal of crystal growth. 2013, Vol 369, pp 1-7, issn 0022-0248, 7 p.Article
A kinetic model of the formation and growth of interstitial dislocation loops in dislocation free silicon single crystalsTALANIN, V. I; TALANIN, I. E.Journal of crystal growth. 2012, Vol 346, Num 1, pp 45-49, issn 0022-0248, 5 p.Article
Float-Zone silicon crystal growth at reduced RF frequenciesROST, H.-J; MENZEL, R; LUEDGE, A et al.Journal of crystal growth. 2012, Vol 360, pp 43-46, issn 0022-0248, 4 p.Conference Paper
Local control of strain in SiGe by ion-implantation techniqueSAWANO, K; HOSHI, Y; HIRAOKA, Y et al.Journal of crystal growth. 2009, Vol 311, Num 3, pp 806-808, issn 0022-0248, 3 p.Conference Paper
Silicon shot solidification in waterCISZEK, T. F.Journal of crystal growth. 2008, Vol 310, Num 7-9, pp 2198-2203, issn 0022-0248, 6 p.Article
The effect of the pressure difference across the free surface on the static meniscus shape in the case of ribbon growth by edge-defined film-fed growth (E.F.G.) methodBALIN, St; BALINT, A. M.Journal of crystal growth. 2008, Vol 311, Num 1, pp 32-37, issn 0022-0248, 6 p.Article
Single-grain Si TFTs and circuits fabricated through advanced excimer-laser crystallizationISHIHARA, Ryoichi; RANA, Vikas; MING HE et al.Solid-state electronics. 2008, Vol 52, Num 3, pp 353-358, issn 0038-1101, 6 p.Conference Paper
The effect of a static magnetic field on buoyancy-aided silicon dissolution into germanium meltARMOUR, Neil; DOST, Sadik.Journal of crystal growth. 2007, Vol 306, Num 1, pp 200-207, issn 0022-0248, 8 p.Article
Effect of electromagnetic stirring on the enrichment of primary silicon from Al―Si meltWENZHOU YU; WENHUI MA; GUOQIANG LV et al.Journal of crystal growth. 2014, Vol 405, pp 23-28, issn 0022-0248, 6 p.Article
Annealing effects on the size of Si-nanocrystals embedded in bulk SiOWEIWEI KE; XUE FENG; YIDONG HUANG et al.Journal of crystal growth. 2011, Vol 316, Num 1, pp 191-195, issn 0022-0248, 5 p.Article
Growth of 450 mm diameter semiconductor grade silicon crystalsZHENG LU; KIMBEL, Steven.Journal of crystal growth. 2011, Vol 318, Num 1, pp 193-195, issn 0022-0248, 3 p.Conference Paper
Optimizing dopant activation in Si:P double δ-layersMCKIBBIN, Sarah R; CLARKE, Warrick R; FUHRER, Andreas et al.Journal of crystal growth. 2010, Vol 312, Num 21, pp 3247-3250, issn 0022-0248, 4 p.Article
Phosphorus gettering of precipitated Cu in single crystalline silicon based on rapid thermal processXIAOQIANG LI; DEREN YANG; XUEGONG YU et al.Journal of crystal growth. 2010, Vol 312, Num 21, pp 3069-3074, issn 0022-0248, 6 p.Article
Gas phase nucleation of crystalline silicon and their role in low-temperature deposition of microcrystalline films during hot-wire chemical vapor depositionLEE, Sung-Soo; KO, Min-Sung; KIM, Chan-Soo et al.Journal of crystal growth. 2008, Vol 310, Num 15, pp 3659-3662, issn 0022-0248, 4 p.Article