au.\*:("BASTING D")
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THE XECL EXCIMER LASER: A POWERFUL AND EFFICIENT UV PUMPING SOURCE FOR TUNABLE DYE LASERSTELLE H; HUEFFER W; BASTING D et al.1981; OPT. COMMUN.; ISSN 0030-4018; NLD; DA. 1981; VOL. 38; NO 5-6; PP. 402-406; BIBL. 23 REF.Article
THE PHENOXAZONES: A NEW CLASS OF LASER DYES.BASTING D; OUW D; SCHAFER FP et al.1976; OPT. COMMUNIC.; NETHERL.; DA. 1976; VOL. 18; NO 3; PP. 260-262; BIBL. 6 REF.Article
Excimer lasers : current status and future developmentsREBHAN, U; BASTING, D.Berichte der Bunsen-Gesellschaft. 1993, Vol 97, Num 12, pp 1504-1511, issn 0940-483XConference Paper
UV-Laser für die Mikrobearbeitung = UV laser for microprocessingBASTING, D; ENDERT, H.F & M. Feinwerktechnik, Mikrotechnik, Messtechnik. 1997, Vol 105, Num 9, pp 610-612, issn 0944-1018Article
A simple, high power nitrogen laserBASTING, D; SCHÄFER, F. P; STEYER, B et al.SPIE milestone series. 2000, Vol 159, pp 552-558, issn 1050-0529Article
Highest power excimer lasersMÜLLER-HORSCHE, E; OESTERLIN, P; BASTING, D et al.SPIE milestone series. 2000, Vol 159, pp 255-260, issn 1050-0529Article
Excimer laser : a new tool for precision micromachiningENDERT, H; PÄTZEL, R; BASTING, D et al.Optical and quantum electronics. 1995, Vol 27, Num 12, pp 1319-1335, issn 0306-8919Article
Tuning ranges of an injection locked excimer laserRÜCKLE, B; LOKAI, P; BRINKMANN, U et al.Optics and laser technology. 1987, Vol 19, Num 3, pp 153-157, issn 0030-3992Article
New KrF and ArF excimer lasers for advanced deep ultraviolet optical lithographyENDERT, H; PÄTZEL, R; REBHAN, U et al.Japanese journal of applied physics. 1995, Vol 34, Num 8A, pp 4050-4054, issn 0021-4922, 1Article
Fiberoptic LAN controls an excimer laserROSENKRANZ, H; REBHAN, U; MUCKENHEIM, W et al.Laser focus (1983). 1988, Vol 24, Num 5, pp 140-142, issn 0740-2511, 2 p.Article
Excimer laser with high repetition rate for DUV lithographyPÄTZEL, R; BRAGIN, I; KLEINSCHMIDT, J et al.Microelectronic engineering. 1996, Vol 30, Num 1-4, pp 165-167, issn 0167-9317Conference Paper
ArF excimer laser for 193 nm lithographySTAMM, U; PÄTZEL, R; KLEINSCHMIDT, J et al.SPIE proceedings series. 1998, pp 1010-1013, isbn 0-8194-2779-9Conference Paper
New KrF and ArF excimer laser for advanced DUV lithographyENDERT, H; PÄTZEL, R; POWELL, M et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 221-224, issn 0167-9317Conference Paper
Operational stability of a compact 600-W KrF laserBORISOV, V. M; VINOKHODOV, A. Yu; VODCHITS, V. A et al.Quantum electronics (Woodbury). 1998, Vol 28, Num 2, pp 123-126, issn 1063-7818Article
High accuracy microdrilling of steel with solid-state UV laser at 10 mm/sec rateGOVORKOV, S. V; SLOBODTCHIKOV, E. V; WIESSNER, A. O et al.SPIE proceedings series. 2000, pp 365-370, isbn 0-8194-3550-3Conference Paper
Compact 600-W KrF laserBORISOV, V. M; VINOKHODOV, A. Yu; VODCHITS, V. A et al.Quantum electronics (Woodbury). 1998, Vol 28, Num 2, pp 119-122, issn 1063-7818Article
High power ultraviolet all-solid-state laser for industrial applicationsMEHLMANN, C; SCHRÖDER, T; KLOPP, P et al.SPIE proceedings series. 1999, pp 396-402, isbn 0-8194-3088-9Conference Paper
High average power Ce:LiCaF laser at 1KHz repetition rate tunable from 280 nm to 315 nmGOVORKOV, S; WIESSNER, A; GENTER, P et al.SPIE proceedings series. 1998, pp 60-65, isbn 0-8194-2713-6Conference Paper