E-beam-induced fabrication of microstructuresBRÜNGER, W. H; KOHLMANN, K. T.Journal of microelectromechanical systems. 1993, Vol 2, Num 1, pp 30-32, issn 1057-7157Article

La sécurité transfusionnelle dans les pays en développement : les leçons de l'OugandaBONTINCK, M; BRUNGER, W; FRANSEN, L et al.1997, 161 p., isbn 9-282-80576-XBook

Evaluation of critical design parameters of an ion projector for 1 Gbit DRAM productionBRÜNGER, W. H; LÖSCHNER, H; FALLMANN, W et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 323-326, issn 0167-9317Conference Paper

Low energy lithography; energy control and variable energy exposureBRÜNGER, W; KLEY, E.-B; SCHNABEL, B et al.Microelectronic engineering. 1995, Vol 27, Num 1-4, pp 135-138, issn 0167-9317Conference Paper

Edge roughness of a 200-nm pitch resist pattern fabricated by ion projection lithographyBRÜNGER, W. H; BLASCHKE, J; TORKLER, M et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1993, Vol 11, Num 6, pp 2404-2408, issn 1071-1023Conference Paper

Resolution limits in electron-beam induced tungsten depositionKOHLMANN-VON PLATEN, K. T; CHLEBEK, J; WEISS, M et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1993, Vol 11, Num 6, pp 2219-2223, issn 1071-1023Conference Paper

Stability and electronic adjustment of ion images projected at 10× reductionBRÜNGER, W. H; TORKLER, M; BUCHMANN, L. M et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2829-2833, issn 1071-1023Conference Paper

Mask manufacture for projection mask-less lithography (PML) : EMMS-technology for a programmable aperture platesystemREIMER, K; WITT, M; KÄHLER, D et al.SPIE proceedings series. 2005, pp 196-204, isbn 0-8194-5830-9, 9 p.Conference Paper