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Understanding the Superlinear Onset of Tunnel-FET Output CharacteristicDE MICHIELIS, Luca; LATTANZIO, Livio; IONESCU, Adrian M et al.IEEE electron device letters. 2012, Vol 33, Num 11, pp 1523-1525, issn 0741-3106, 3 p.Article

A new robust non-local algorithm for band-to-band tunneling simulation and its application to Tunnel-FETCHEN SHEN; YANG, Li-Tao; SAMUDRA, Ganesh et al.Solid-state electronics. 2011, Vol 57, Num 1, pp 23-30, issn 0038-1101, 8 p.Article

Band-to-band tunneling induced substrate hot electron injection (BBISHE) to perform programming for NOR flash memoryWU, Meng-Yi; DAI, Sheng-Huei; LEE, Kung-Hong et al.Solid-state electronics. 2006, Vol 50, Num 3, pp 309-315, issn 0038-1101, 7 p.Article

Tunneling and Occupancy Probabilities: How Do They Affect Tunnel-FET Behavior?DE MICHIELIS, Luca; LATTANZIO, Livio; MOSELUND, Kirsten E et al.IEEE electron device letters. 2013, Vol 34, Num 6, pp 726-728, issn 0741-3106, 3 p.Article

Complex Band Structures: From Parabolic to Elliptic ApproximationXIMENG GUAN; KIM, Donghyun; SARASWAT, Krishna C et al.IEEE electron device letters. 2011, Vol 32, Num 9, pp 1296-1298, issn 0741-3106, 3 p.Article

Temperature and drain voltage dependence of gate-induced drain leakageLOPEZ, L; MASSON, P; NEE, D et al.Microelectronic engineering. 2004, Vol 72, Num 1-4, pp 101-105, issn 0167-9317, 5 p.Conference Paper

Impact of Quantum Confinement on Gate Threshold Voltage and Subthreshold Swings in Double-Gate Tunnel FETsPADILLA, José L; GAMIZ, Francisco; GODOY, Andrés et al.I.E.E.E. transactions on electron devices. 2012, Vol 59, Num 12, pp 3205-3211, issn 0018-9383, 7 p.Article

Analytical model of single-gate silicon-on-insulator (SOI) tunneling field-effect transistors (TFETs)MIN JIN LEE; WOO YOUNG CHOI.Solid-state electronics. 2011, Vol 63, Num 1, pp 110-114, issn 0038-1101, 5 p.Article

Investigation of the performance and band-to-band tunneling effect of a new double-halo-doping carbon nanotube field-effect transistorAREFINIA, Zahra.Physica. E, low-dimentional systems and nanostructures. 2009, Vol 41, Num 10, pp 1767-1771, issn 1386-9477, 5 p.Article

Device-aware yield-centric Dual-Vt design under parameter variations in nanoscale technologiesAGARWAL, Amit; KUNHYUK KANG; BHUNIA, Swarup et al.IEEE transactions on very large scale integration (VLSI) systems. 2007, Vol 15, Num 6, pp 660-671, issn 1063-8210, 12 p.Article

Band-to-Band-Tunneling Leakage Suppression for Ultra-Thin-Body GeOI MOSFETs Using Transistor StackingHU, Vita Pi-Ho; FAN, Ming-Long; PIN SU et al.IEEE electron device letters. 2012, Vol 33, Num 2, pp 197-199, issn 0741-3106, 3 p.Article

Impact of process and geometrical parameters on the electrical characteristics of vertical nanowire silicon n-TFETsVANDOOREN, A; LEONELLI, D; ROOYACKERS, R et al.Solid-state electronics. 2012, Vol 72, pp 82-87, issn 0038-1101, 6 p.Article

Impact of source-to-drain tunnelling on the scalability of arbitrary oriented alternative channel material nMOSFETsRAFHAY, Quentin; CLERC, Raphaël; GHIBAUDO, Gérard et al.Solid-state electronics. 2008, Vol 52, Num 10, pp 1474-1481, issn 0038-1101, 8 p.Conference Paper

A novel p-channel nitride-trapping nonvolatile memory device with excellent reliability propertiesLUE, Hang-Ting; HSIEH, Kuang-Yeu; LIU, Rich et al.IEEE electron device letters. 2005, Vol 26, Num 8, pp 583-585, issn 0741-3106, 3 p.Article

Strained-Si1―xGex/Si Band-to-Band Tunneling Transistors: Impact of Tunnel-Junction Germanium Composition and Doping Concentration on Switching BehaviorNAYFEH, Osama M; HOYT, Judy L; ANTONIADIS, Dimitri A et al.I.E.E.E. transactions on electron devices. 2009, Vol 56, Num 10, pp 2264-2269, issn 0018-9383, 6 p.Article

Analysis of Single-Photon-Detection Characteristics of GaInAs/InP Avalanche PhotodiodesSUGIHARA, Kohei; YAGYU, Eiji; NISHIOKA, Tsuyoshi et al.IEEE journal of quantum electronics. 2010, Vol 46, Num 9-10, pp 1444-1449, issn 0018-9197, 6 p.Article

Performance Enhancement of Nanowire Tunnel Field-Effect Transistor With Asymmetry-Gate Based on Different Screening LengthJHAN, Yi-Ruei; WU, Yung-Chun; HUNG, Min-Feng et al.IEEE electron device letters. 2013, Vol 34, Num 12, pp 1482-1484, issn 0741-3106, 3 p.Article

Doping-Less Tunnel Field Effect Transistor: Design and InvestigationJAGADESH KUMAR, M; JANARDHANAN, Sindhu.I.E.E.E. transactions on electron devices. 2013, Vol 60, Num 10, pp 3285-3290, issn 0018-9383, 6 p.Article

Buried triple-gate structures for advanced field-effect transistor devicesMULLER, M. R; GUMPRICH, A; SCHÜTTE, F et al.Microelectronic engineering. 2014, Vol 119, pp 95-99, issn 0167-9317, 5 p.Article

Modeling the impact of junction angles in tunnel field-effect transistorsKAO, Kuo-Hsing; VERHULST, Anne S; VANDENBERGHE, William G et al.Solid-state electronics. 2012, Vol 69, pp 31-37, issn 0038-1101, 7 p.Article

Experimental Investigation of the Tunneling Injection Boosters for Enhanced ION ETSOI Tunnel FETVILLALON, Anthony; LE ROYER, Cyrille; CASSE, Mikaël et al.I.E.E.E. transactions on electron devices. 2013, Vol 60, Num 12, pp 4079-4084, issn 0018-9383, 6 p.Article

Complementary Germanium Electron-Hole Bilayer Tunnel FET for Sub-0.5-V OperationLATTANZIO, Livio; DE MICHIELIS, Luca; IONESCU, Adrian M et al.IEEE electron device letters. 2012, Vol 33, Num 2, pp 167-169, issn 0741-3106, 3 p.Article

The electron―hole bilayer tunnel FETLATTANZIO, Livio; DE MICHIELIS, Luca; IONESCU, Adrian M et al.Solid-state electronics. 2012, Vol 74, pp 85-90, issn 0038-1101, 6 p.Article

Abrupt switch based on internally combined band-to-band and barrier tunneling mechanismsLATTANZIO, Livio; BISWAS, Arnab; DE MICHIELIS, Luca et al.Solid-state electronics. 2011, Vol 65-66, pp 234-239, issn 0038-1101, 6 p.Conference Paper

Investigation of drain disturb in SONOS flash EEPROMsBHARATH KUMAR, P; SHARMA, Ravinder; NAIR, Pradeep R et al.I.E.E.E. transactions on electron devices. 2007, Vol 54, Num 1, pp 98-105, issn 0018-9383, 8 p.Article

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