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Lithography Asia 2009 (18-19 November 2009, Taipei, Taiwan)Chen, Alek C.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 1 vol, isbn 978-0-8194-7909-9 0-8194-7909-8Conference Proceedings

Analyzing Electrostatic Induced Damage Risk to Reticles with an In-situ E-Reticle SystemTU, Richard; SEBALD, Thomas.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752015.1-752015.10Conference Paper

Characterizing the 65nm through-pitch sensitivity to scanner parameters by CD SEM and Scatterometry metrologiesSHIEH, Jason; CHEN, Alek.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752024.1-752024.8Conference Paper

Dissolved gas quantification and bubble formation in liquid chemical dispenseTOM, Glenn; WEI LIU.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752039.1-752039.9Conference Paper

PH control of water flowing in micro structure by local electrical field methodTAKANO, Akihiro; KAWAI, Akira.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752033.1-752033.9Conference Paper

Relaxation properties of dielectric dipoles of photo resist materialsSASAZAKI, Hiroki; KAWAI, Akira.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75202X.1-75202X.7Conference Paper

Systematic Defect Management by Design Aware InspectionCHANG, Ellis; PARK, Allen.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75201C.1-75201C.5Conference Paper

Micro bubble condensation in micro channel controlled by local electrical field methodOHATA, Shunsuke; KAWAI, Akira.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752034.1-752034.11Conference Paper

Mueller matrix polarimetry for immersion lithography tools with a polarization monitoring system at the wafer planeNOMURA, Hiroshi; HIGASHIKAWA, Iwao.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752012.1-752012.12Conference Paper

Micro bubble removal from micro pattern structure under alternating electric fieldSASAZAKI, Hiroki; KAWAI, Akira.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75202Z.1-75202Z.11Conference Paper

Decades of Rivalry and Complementary of Photon and Electron BeamsLIN, Bum J.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752004.1-752004.11Conference Paper

Durability of self-standing resist sheet composed with micro holesTAKANO, Akihiro; KAWAI, Akira.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752032.1-752032.9Conference Paper

Novel assist feature design to improve depth of focus in low kl EUV lithographyKANG, Hoyoung.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752037.1-752037.7Conference Paper

Spontaneous deformation of resist micro pattern due to van der Waals interactionKAWAI, Akira; YAMAJI, Takashi.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75202Y.1-75202Y.12Conference Paper

Optimization of alignment/overlay sampling and marker layout to improve overlay performance for double patterning technologyCHUE, Chuei-Fu; CHIOU, Tsann-Bim; HUANG, Chun-Yen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75200G.1-75200G.12Conference Paper

Process Capability Comparison between LELE DPT and Spacer for NAND Flash 32nm and belowTSENG, Shih-En; CHEN, Alek C.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7140, issn 0277-786X, isbn 978-0-8194-7381-3 0-8194-7381-2, 714035.1-714035.11, 2Conference Paper

Fast Converging Inverse Lithography Algorithm Incorporating Image Gradient Descent MethodsYU, Jue-Chin; PEICHEN YU.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75200V.1-75200V.13Conference Paper

FAST-LH, a manufacturing-environmental friendly method of lens heating monitoringYET SIEW ING; LIM, Faith.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75202J.1-75202J.7Conference Paper

Litho-freeze-litho-etch (LFLE) enabling dual wafer flow coat/develop process and freeze CD tuning bake for >200wph immersion ArF photolithography double patterningPIECZULEWSKI, Charles N; ROSSLEE, Craig A.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75201H.1-75201H.12Conference Paper

3D Integration Opportunities, Issues, and Solutions: A Designer's PerspectiveKWAI, Ding-Ming; WU, Cheng-Wen.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752003.1-752003.10Conference Paper

Feasibility Studies of source and mask optimizationNAKASHIMA, Toshiharu; MATSUYAMA, Tomoyuki; OWA, Soichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75200C.1-75200C.10Conference Paper

Back Side Photomask Haze RevisitedGRENON, Brian J; KISHKOVICH, Oleg.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752018.1-752018.12Conference Paper

Hierarchical DPT Mask Planning For Contact LayerQIAO LI; GHOSH, Pradiptya; LACOUR, Pat et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75201O.1-75201O.10Conference Paper

Using Transmission Line Theory to Calculate Equivalent Refractive Index of EUV Mask Multilayer Structures for Efficient Scattering Simulation by Finite-Difference Time-Domain MethodLEE, Yen-Min; LI, Jia-Han; NG, Philip C. W et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 75200W.1-75200W.9Conference Paper

The Lithography Technology for the 32 nm HP and BeyondDUSA, Mircea; ARNOLD, Bill; FINDERS, Jo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702810.1-702810.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

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