LASER OSCILLATION ON THE GREEN BANDS OF XEO AND KRO.POWELL HT; MURRAY JR; RHODES CK et al.1974; APPL. PHYS. LETTERS; U.S.A.; DA. 1974; VOL. 25; NO 12; PP. 730-732; BIBL. 12 REF.Article

A KINETICS SCHEME FOR THE XEF LASER.FINN TG; PALUMBO LJ; CHAMPAGNE LF et al.1978; APPL. PHYS. LETTERS; USA; DA. 1978; VOL. 33; NO 2; PP. 148-151; BIBL. 14 REF.Article

MEASUREMENTS OF KINETIC PROCESSES IN A SELF-SUSTAINED DISCHARGE XEF LASERGOWER MC; EXBERGER R; ROWLEY PD et al.1978; APPL. PHYS. LETTERS; USA; DA. 1978; VOL. 33; NO 1; PP. 65-67; BIBL. 13 REF.Article

LASER ACTION ON THE ²SIGMA ₁₂⁺->²SIGMA ₁₂⁺ BANDS OF KRF AND XECL.EWING JJ; BRAU CA.1975; APPL. PHYS. LETTERS; U.S.A.; DA. 1975; VOL. 27; NO 6; PP. 350-352; BIBL. 9 REF.Article

THE EFFECT OF GROUND STATE POPULATION ON THE XEF LASER PERFORMANCEROKNI M; JACOB JH; HSIA JC et al.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 36; NO 4; PP. 243-245; BIBL. 11 REF.Article

HIGH-ENERGY LASING OF XEBR IN AN ELECTRIC DISCHARGE.SZE RC; SCOTT PB.1978; APPL. PHYS. LETTERS; USA; DA. 1978; VOL. 32; NO 8; PP. 479-480; BIBL. 4 REF.Article

STIMULATED EMISSION AT 281.8 NM FROM XEBR.SEARLES SK; HART GA.1975; APPL. PHYS. LETTERS; U.S.A.; DA. 1975; VOL. 27; NO 4; PP. 243-245; BIBL. 6 REF.Article

354-NM LASER ACTION ON XEF.BRAU CA; EWING JJ.1975; APPL. PHYS. LETTERS; U.S.A.; DA. 1975; VOL. 27; NO 8; PP. 435-437; BIBL. 10 REF.Article

A 490-NM XEF ELECTRIC DISCHARGE LASERFISHER CH; CENTER RE; MULLANEY GJ et al.1979; APPL. PHYS. LETTERS; USA; DA. 1979; VOL. 35; NO 1; PP. 26-28; BIBL. 8 REF.Article

CHARACTERISTICS OF THE ELECTRON-BEAM-CONTROLLED XEF LASERCHAMPAGNE LF; HARRIS NW.1978; APPL. PHYS. LETTERS; USA; DA. 1978; VOL. 33; NO 3; PP. 248-250; BIBL. 10 REF.Article

LES GAZ INERTES EN TANT QUE COMPOSANTES DE LASER CHIMIQUEGUDZENKO LI; LAKOBA IS.1977; DOKL. AKAD. NAUK S.S.S.R.; S.S.S.R.; DA. 1977; VOL. 233; NO 6; PP. 1083-1085; BIBL. 12 REF.Article

FAST-DISCHARGE-INITIATED XEF LASER.WANG CP; MIRELS H; SUTTON DG et al.1976; APPL. PHYS. LETTERS; U.S.A.; DA. 1976; VOL. 28; NO 6; PP. 326-328; BIBL. 7 REF.Article

PHOTOLYTIC PUMPING OF THE IODINE LASER BY XEBR.SWINGLE JC; TURNER CE JR; MURRAY JR et al.1976; APPL. PHYS. LETTERS; U.S.A.; DA. 1976; VOL. 28; NO 7; PP. 387-388; BIBL. 14 REF.Article

XEBR EXCIPLEX LASER.SEARLES SK.1976; APPL. PHYS. LETTERS; U.S.A.; DA. 1976; VOL. 28; NO 10; PP. 602-603; BIBL. 8 REF.Article

THE ROLE OF THE C STATE IN THE XEF LASERFINN TG; PALUMBO LJ; CHAMPAGNE LF et al.1979; APPL. PHYS. LETTERS; USA; DA. 1979; VOL. 34; NO 1; PP. 52-55; BIBL. 13 REF.Article

ETUDE DE L'AMPLIFICATION ET DES CARACTERISTIQUES TEMPORELLES DE LA DECHARGE DANS UN LASER AU XEF A DEUX MODULESOGLUZDIN VE; KHERIG G.1979; Z. TEH. FIZ.; ISSN 0044-4642; SUN; DA. 1979; VOL. 49; NO 10; PP. 2282-2284; BIBL. 8 REF.Article

FORMATION AND QUENCHING OF XEF IN NE/XE/F₂ MIXTURES.ROKNI M; JACOB JH; MANGANO JA et al.1978; APPL. PHYS. LETTERS; U.S.A.; DA. 1978; VOL. 32; NO 4; PP. 223-225; BIBL. 12 REF.Article

IMPROVEMENT IN XEF LASER EFFICIENCY AT ELEVATED TEMPERATURESHSIA JC; MANGANO JA; JACOB JH et al.1979; APPL. PHYS. LETTERS; USA; DA. 1979; VOL. 34; NO 3; PP. 208-210; BIBL. 13 REF.Article

ELECTRON-BEAM-CONTROLLED DISCHARGE XECL EXCIMER LASER.LEVATTER JI; MORRIS JH; SHAO CHI LIN et al.1978; APPL. PHYS. LETTERS; U.S.A.; DA. 1978; VOL. 32; NO 10; PP. 630-632; BIBL. 17 REF.Article

SPECTROSCOPIC STUDY OF A DISCHARGE-PUMPED XEF LASER AT HIGH RESOLUTION.SHIMAUCHI M; KARASAWA S; MIURA T et al.1978; JAP. J. APPL. PHYS.; JAP.; DA. 1978; VOL. 17; NO 3; PP. 527-533; BIBL. 6 REF.Article

THE INFLUENCE OF DILUENT GAS ON THE XEF LASER.CHAMPAGNE LF; HARRIS NW.1977; APPL. PHYS. LETTERS; U.S.A.; DA. 1977; VOL. 31; NO 8; PP. 513-515; BIBL. 12 REF.Article

GAIN MEASUREMENTS ON THE TRIATOMIC EXCIMER XE₂CLTANG KY; LORENTS DC; HUESTIS DL et al.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 36; NO 5; PP. 347-349; BIBL. 9 REF.Article

A DISCHARGE PUMPED LASER ON THE C->A TRANSITION OF XEFBURNHAM R.1979; APPL. PHYS. LETTERS; USA; DA. 1979; VOL. 35; NO 1; PP. 48-49; BIBL. 4 REF.Article

OPTIMAL TIMING AND POWER ENHANCEMENT OBSERVED IN A DOUBLE-PULSE FAST-DISCHARGE-DRIVEN XEF LASER.AKINS RP; INNIS G; SHAO CHI LIN et al.1978; J. APPL. PHYS.; U.S.A.; DA. 1978; VOL. 49; NO 4; PP. 2262-2265; BIBL. 14 REF.Article

GAIN AND FLUORESCENCE MEASUREMENTS IN PHOTOIONIZATION-STABILIZED XEF DISCHARGE LASERS OPERATING AT HIGH-ENERGY LOADINGS.HASSON V; LEE CM; EXBERGER R et al.1977; APPL. PHYS. LETTERS; U.S.A.; DA. 1977; VOL. 31; NO 3; PP. 167-169; BIBL. 11 REF.Article